SCHEMBL24254817

SCHEMBL24254817

Fc1c(F)c(C(F)(F)F)c(F)c(F)c1N(c1ccccc1)c1ccccc1-c1ccccc1N(c1ccccc1)c1c(F)c(F)c(C(F)(F)F)c(F)c1F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24254695 0.88 MEN1 (0.31)
SCHEMBL24254816 0.84 ALDH1A1 (0.33)
SCHEMBL24254706 0.84 ALDH1A1 (0.38)
SCHEMBL24254641 0.84 ALDH1A1 (0.38)
SCHEMBL24254805 0.79 SIGMAR1 (0.34)
SCHEMBL24254693 0.77 MEN1 (0.30)
SCHEMBL24254686 0.77 RXRA (0.33)
SCHEMBL5149203 0.72 ALDH1A1 (0.44)
SCHEMBL24254833 0.72 KIF11 (0.32)
SCHEMBL12853968 0.70 ALDH1A1 (0.42)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2022034907-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN 東ソー株式会社 2022-02-17 WO disclosed