Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.47 |
| ▸ | CYP1A2 | P05177 | 4/20 | 0.41 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.41 |
| ▸ | HTR2A | P28223 | 1/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.41 |
| ▸ | GPR84 | Q9NQS5 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.39 |
| ▸ | MEN1 | O00255 | 2/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.39 |
| ▸ | HPGD | P15428 | 2/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.39 |
| ▸ | GLA | P06280 | 1/20 | 0.39 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.39 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.39 |
| ▸ | TRPM4 | Q8TD43 | 1/20 | 0.38 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.37 |
| ▸ | RECQL | P46063 | 1/20 | 0.37 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.37 |
| ▸ | CYP1B1 | Q16678 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL241213 | 0.85 | MEN1 (0.40) | LMNACYP1A2CYP2D6HTR2AL3MBTL1 | |
| SCHEMBL22288182 | 0.83 | TACR3 (0.41) | LMNACYP1A2CYP2D6HTR2AL3MBTL1 | |
| SCHEMBL2113581 | 0.82 | MAPT (0.41) | LMNACYP1A2CYP2D6L3MBTL1ALDH1A1 | |
| SCHEMBL2113229 | 0.80 | MAPT (0.43) | LMNACYP1A2L3MBTL1ALDH1A1MEN1 | |
| SCHEMBL13217608 | 0.80 | HTR2A (0.41) | CYP1A2CYP2D6HTR2AL3MBTL1ALDH1A1 | |
| SCHEMBL5907411 | 0.79 | LMNA (0.42) | LMNACYP1A2CYP2D6ALDH1A1HSD17B10 | |
| SCHEMBL8766338 | 0.79 | HTR2A (0.37) | CYP1A2CYP2D6HTR2AL3MBTL1ALDH1A1 | |
| SCHEMBL8209772 | 0.79 | HTR2A (0.43) | CYP1A2HTR2AL3MBTL1GPR84ALDH1A1 | |
| SCHEMBL27654127 | 0.78 | ALDH1A1 (0.43) | CYP1A2HTR2AL3MBTL1ALDH1A1HSD17B10 | |
| SCHEMBL27654129 | 0.78 | ALDH1A1 (0.43) | CYP1A2HTR2AL3MBTL1ALDH1A1HSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 50 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1478681-A4 | SPIN-ON-GLASS ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY | HONEYWELL INT INC (US) | 2006-10-11 | — | — | EP | claimed |
| EP-1478681-A1 | SPIN-ON-GLASS ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY | Honeywell International, Inc. (US) | 2004-11-24 | — | — | EP | claimed |
| WO-2003044077-A1 | SPIN-ON-GLASS ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY | HONEYWELL INTERNATIONAL INC. (US) | 2003-05-30 | — | — | WO | claimed |
| WO-2020155595-A1 | AEROBIC OXIDATION SYSTEM CONTAINING SULFINIC ACID, SULFONIC ACID OR DERIVATIVES THEREOF AND PHOTOCATALYTIC OXIDATION METHOD THEREFOR | 清华大学 | 2020-08-06 | — | — | WO | disclosed |
| EP-1695142-B1 | ANTIREFLECTIVE COATINGS FOR VIA FILL AND PHOTOLITHOGRAPHY APPLICATIONS AND METHODS OF PREPARATION THEREOF | HONEYWELL INT INC (US) | 2019-07-31 | — | — | EP | disclosed |
| CN-103627316-B | ARC of filling perforation and photoetching and preparation method thereof | 霍尼韦尔国际公司 | 2016-08-03 | — | — | CN | disclosed |
| US-9069133-B2 | Anti-reflective coating for photolithography and methods of preparation thereof | HONEYWELL INTERNATIONAL INC. (US) | 2015-06-30 | — | — | US | disclosed |
| US-8992806-B2 | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof | HONEYWELL INTERNATIONAL INC. (US) | 2015-03-31 | — | — | US | disclosed |
| US-8889334-B2 | Spin-on anti-reflective coatings for photolithography | HONEYWELL INTERNATIONAL INC. (US) | 2014-11-18 | — | — | US | disclosed |
| US-20140227538-A1 | Anti-Reflective Coating for Photolithography and Methods of Preparation Thereof | HONEYWELL INTERNATIONAL INC. (US) | 2014-08-14 | — | — | US | disclosed |
| US-8642246-B2 | Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof | HONEYWELL INTERNATIONAL INC. (US) | 2014-02-04 | — | — | US | disclosed |
| WO-2003044078-A1 | ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY AND METHODS OF PREPARATION THEREOF | HONEYWELL INTERNATIONAL INC. (US) | 2003-05-30 | — | — | WO | disclosed |
| WO-2003044600-A1 | SPIN-ON ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY | HONEYWELL INTERNATIONAL INC. (US) | 2003-05-30 | — | — | WO | disclosed |
| WO-2003044079-A1 | SPIN-ON-GLASS ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY | HONEYWELL INTERNATIONAL INC. (US) | 2003-05-30 | — | — | WO | disclosed |
| WO-2003044077-A1 | SPIN-ON-GLASS ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY | HONEYWELL INTERNATIONAL INC. (US) | 2003-05-30 | — | — | WO | disclosed |
| US-20020095018-A1 | Spin-on-glass anti-reflective coatings for photolithography | HONEYWELL INTERNATIONAL INC. | 2002-07-18 | — | — | US | disclosed |
| EP-0365495-B1 | 9-Anthrylalkyl compounds, their preparation and their use | EKA NOBEL AB (SE) | 1994-03-16 | — | — | EP | disclosed |
| US-5128120-A | Use of 9-anthrylalkyl compounds as derivatization reagents for separation and detection purposes | EKA NOBEL AB (SE) | 1992-07-07 | — | — | US | disclosed |
| US-5015755-A | 9-anthrylalkyl compounds | EKA NOBEL AB (SE) | 1991-05-14 | — | — | US | disclosed |
| EP-0365495-A2 | 9-Anthrylalkyl compounds, their preparation and their use | Eka Nobel Aktiebolag (SE) | 1990-04-25 | — | — | EP | disclosed |