SCHEMBL24355012

SCHEMBL24355012

C=Cc1ccc(OC(C)OCOC2CCCCC2)cc1

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HPGD P15428 3/20 0.36
ALDH1A1 P00352 3/20 0.34
KDM4E B2RXH2 2/20 0.34
MAPT P10636 2/20 0.32
POLB P06746 1/20 0.32
CHRNB2 P17787 1/20 0.31
CHRNB4 P30926 1/20 0.31
CHRNA3 P32297 1/20 0.31
CHRNA7 P36544 1/20 0.31
CHRNA4 P43681 1/20 0.31
SMN1; SMN2 Q16637 2/20 0.31
NPC1 O15118 1/20 0.31
RAB9A P51151 1/20 0.31
LMNA P02545 1/20 0.31
CRHBP P24387 1/20 0.31
HTT P42858 1/20 0.31
CRHR2 Q13324 1/20 0.31
ALDH1A3 P47895 1/20 0.30
MEN1 O00255 1/20 0.30
MITF O75030 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL685735 0.82 ALDH1A1 (0.35) HPGDALDH1A1KDM4EMAPTPOLB
SCHEMBL5702518 0.81 HPGD (0.37) HPGDALDH1A1KDM4ECHRNB2CHRNB4
SCHEMBL5900974 0.80 ALDH1A1 (0.35) HPGDALDH1A1KDM4EMAPTPOLB
SCHEMBL18125567 0.80 HPGD (0.36) HPGDALDH1A1KDM4ECHRNB2CHRNB4
SCHEMBL685844 0.79 NFE2L2 (0.40) HPGDALDH1A1KDM4ECHRNB2CHRNB4
SCHEMBL15759688 0.79 NFE2L2 (0.40) HPGDALDH1A1KDM4ECHRNB2CHRNB4
SCHEMBL7642083 0.79 HPGD (0.47) HPGDALDH1A1MAPTCHRNB2CHRNB4
SCHEMBL24355011 0.77 CHRNB2 (0.37) ALDH1A1MAPTCHRNB2CHRNB4CHRNA3
SCHEMBL18125568 0.77 HPGD (0.45) HPGDALDH1A1KDM4EMAPTCHRNB2
SCHEMBL26197336 0.76 CHRNB2 (0.35) HPGDALDH1A1CHRNB2CHRNB4CHRNA3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220128906-A1 PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS OF TRIMMING PHOTORESIST PATTERNS DUPONT ELECTRONIC MATERIALS INTERNATIONAL, LLC 2022-04-28 US disclosed