Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.40 |
| ▸ | HPGD | P15428 | 13/20 | 0.39 |
| ▸ | PTGES | O14684 | 1/20 | 0.36 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.34 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.34 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.34 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.34 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.34 |
| ▸ | MAOB | P27338 | 1/20 | 0.34 |
| ▸ | HRH3 | Q9Y5N1 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15759688 | 1.00 | NFE2L2 (0.40) | NFE2L2HPGDPTGESCHRNB2CHRNB4 | |
| SCHEMBL5702518 | 0.86 | HPGD (0.37) | HPGDCHRNB2CHRNB4CHRNA3CHRNA7 | |
| SCHEMBL1356712 | 0.86 | TLR4 (0.37) | NFE2L2HPGDALDH1A1 | |
| SCHEMBL18125567 | 0.85 | HPGD (0.36) | HPGDCHRNB2CHRNB4CHRNA3CHRNA7 | |
| SCHEMBL2631350 | 0.82 | NFE2L2 (0.47) | NFE2L2KDM4EALDH1A1HRH3 | |
| Ethylene SCHEMBL27857485 | 0.82 | NFE2L2 (0.40) | NFE2L2CHRNB4CHRNA3ALDH1A1 | |
| SCHEMBL3837476 | 0.82 | NFKB1 (0.41) | NFE2L2HPGDCHRNB2CHRNB4CHRNA3 | |
| SCHEMBL13900747 | 0.81 | NFE2L2 (0.42) | NFE2L2HPGDKDM4EALDH1A1HRH3 | |
| SCHEMBL686105 | 0.81 | NFE2L2 (0.40) | NFE2L2HPGDKDM4EALDH1A1HRH3 | |
| SCHEMBL18746023 | 0.80 | NFE2L2 (0.41) | NFE2L2HPGDKDM4EALDH1A1HRH3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 450 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240027908-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240027908-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2024-01-25 | — | — | US | disclosed |
| US-11640113-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and method of manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2023-05-02 | — | — | US | disclosed |
| US-11640113-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and method of manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2023-05-02 | — | — | US | disclosed |
| CN-115437214-A | Chemically amplified positive photosensitive resin composition, protective film, and element having protective film | 奇美实业股份有限公司 | 2022-12-06 | — | — | CN | disclosed |
| CN-113126435-A | Chemically amplified positive photosensitive resin composition and use thereof | 奇美实业股份有限公司 | 2021-07-16 | — | — | CN | disclosed |
| US-10969685-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-04-06 | — | — | US | disclosed |
| CN-112394618-A | Chemically amplified positive photosensitive resin composition, and protective film and member produced therefrom | 奇美实业股份有限公司 | 2021-02-23 | — | — | CN | disclosed |
| EP-3229075-B1 | PHOTORESIST COMPOSITION, METHOD FOR MANUFACTURING SAME, AND METHOD FOR FORMING RESIST PATTERN | JSR CORP (JP) | 2021-01-06 | — | — | EP | disclosed |
| CN-111999980-A | Chemically amplified positive photosensitive resin composition, protective film and module | 奇美实业股份有限公司 | 2020-11-27 | — | — | CN | disclosed |
| US-20020102491-A1 | Comprising iodinium or sulfonium salt capable of generating a specified sulfonic acid upon irradiation and an acid decomposable resin (such as polyhydroxystyrene) | FUJI PHOTO FILM CO., LTD. | 2002-08-01 | — | — | US | disclosed |
| EP-1199603-A9 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2002-07-31 | — | — | EP | disclosed |
| US-20020058200-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2002-05-16 | — | — | US | disclosed |
| EP-1199603-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2002-04-24 | — | — | EP | disclosed |
| US-20020006578-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2002-01-17 | — | — | US | disclosed |
| US-20010055726-A1 | Positive radiation-sensitive composition | FUJI PHOTO FILM CO., LTD. | 2001-12-27 | — | — | US | disclosed |
| EP-1158363-A1 | Positive resist composition and onium salts of saccharin derivatives | FUJI PHOTO FILM CO., LTD. (JP) | 2001-11-28 | — | — | EP | disclosed |
| US-20010041300-A1 | Positive photoresist composition | FUJIFILM CORPORATION (JP) | 2001-11-15 | — | — | US | disclosed |
| US-20010033993-A1 | Positive-working radiation-sensitive composition | FUJIFILM CORPORATION (JP) | 2001-10-25 | — | — | US | disclosed |
| EP-1059563-A1 | Agent for reducing substrate dependence of resist | Wako Pure Chemical Industries, Ltd. (JP) | 2000-12-13 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20020102491-A1 | Comprising iodinium or sulfonium salt capable of generating a specified sulfonic acid upon irradiation and an acid decomposable resin (such as polyhydroxystyrene) | RARA, ARSA, RARB | NFE2L2 3590/4885HPGD 1619/4885PTGES 3245/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.