SCHEMBL2436263

SCHEMBL2436263

CCCCCCCCOc1ccc([I+]c2ccc(OCCCCCCCC)cc2)cc1.O=S(=O)([O-])C(F)(F)C(F)(F)C(F)(F)S(=O)(=O)O

nearest known ligand 0.42

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
NR5A1 Q13285 1/20 0.42
TSHR P16473 3/20 0.41
TP53 P04637 1/20 0.41
S1PR1 P21453 1/20 0.41
PLA2G4B P0C869 6/20 0.40
CA12 O43570 1/20 0.40
CA1 P00915 1/20 0.40
CA2 P00918 1/20 0.40
CA7 P43166 1/20 0.40
CA9 Q16790 1/20 0.40
NPC1 O15118 1/20 0.40
RAB9A P51151 1/20 0.40
RARB P10826 3/20 0.39
THRA P10827 1/20 0.38
THRB P10828 1/20 0.38
MAPK1 P28482 1/20 0.38
RECQL P46063 1/20 0.38
PLA2G4A P47712 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2437076 0.98 NR5A1 (0.42) NR5A1TSHRTP53S1PR1PLA2G4B
SCHEMBL2436260 0.94 TSHR (0.44) NR5A1TSHRTP53S1PR1PLA2G4B
SCHEMBL2437074 0.92 TSHR (0.44) NR5A1TSHRTP53S1PR1PLA2G4B
SCHEMBL29745975 0.89 TSHR (0.47) NR5A1TSHRTP53S1PR1PLA2G4B
SCHEMBL2434626 0.87 TSHR (0.42) NR5A1TSHRTP53PLA2G4BCA12
SCHEMBL2437727 0.86 TSHR (0.41) NR5A1TSHRTP53PLA2G4BCA12
Trifluoromethanesulfonic Acid SCHEMBL4619730 0.85 TSHR (0.48) NR5A1TSHRTP53S1PR1PLA2G4B
Trifluoromethanesulfonic Acid SCHEMBL4618765 0.85 TSHR (0.48) NR5A1TSHRTP53S1PR1PLA2G4B
SCHEMBL3872702 0.84 LTA4H (0.42) NR5A1TSHRTP53PLA2G4BCA12
SCHEMBL2438060 0.84 TSHR (0.47) NR5A1TSHRTP53S1PR1PLA2G4B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 34 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2078028-B1 PHOTOACTIVE COMPOUNDS AZ ELECTRONIC MATERIALS USA (US) 2011-09-07 EP claimed
US-7833693-B2 Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity AZ ELECTRONIC MATERIALS USA CORP. 2010-11-16 US claimed
EP-2121783-A1 POLYMERS USEFUL IN PHOTORESIST COMPOSITIONS AND COMPOSITIONS THEREOF AZ Electronic Materials USA Corp. (US) 2009-11-25 EP claimed
US-7601480-B2 Photoactive compounds AZ ELECTRONIC MATERIALS USA CORP. (US) 2009-10-13 US claimed
EP-2102184-A2 PHOTOACTIVE COMPOUNDS AZ Electronic Materials USA Corp. (US) 2009-09-23 EP claimed
EP-2102156-A2 PHOTOACTIVE COMPOUNDS AZ Electronic Materials USA Corp. (US) 2009-09-23 EP claimed
EP-2078028-A1 PHOTOACTIVE COMPOUNDS AZ Electronic Materials USA Corp. (US) 2009-07-15 EP claimed
US-7491482-B2 Photoactive compounds AZ ELECTRONIC MATERIALS USA CORP. (US) 2009-02-17 US claimed
WO-2008087549-A1 POLYMERS USEFUL IN PHOTORESIST COMPOSITIONS AND COMPOSITIONS THEREOF AZ ELECTRONIC MATERIALS USA CORP. (DE) 2008-07-24 WO claimed
US-20080171270-A1 Polymers Useful in Photoresist Compositions and Compositions Thereof AZ ELECTRONIC MATERIALS USA CORP. 2008-07-17 US claimed
US-20080153032-A1 Photoactive Compounds MERCK PATENT GMBH (DE) 2008-06-26 US claimed
US-7390613-B1 Photoactive compounds AZ ELECTRONIC MATERIALS USA CORP. (US) 2008-06-24 US claimed
WO-2008068617-A2 PHOTOACTIVE COMPOUNDS AZ ELECTRONIC MATERIALS USA CORP. (DE) 2008-06-12 WO claimed
WO-2008068610-A2 PHOTOACTIVE COMPOUNDS AZ ELECTRONIC MATERIALS USA CORP. (DE) 2008-06-12 WO claimed
US-20080131811-A1 Photoactive Compounds MERCK PATENT GMBH (DE) 2008-06-05 US claimed
US-20080131810-A1 Photoactive Compounds MERCK PATENT GMBH (DE) 2008-06-05 US claimed
WO-2008041123-A1 PHOTOACTIVE COMPOUNDS AZ ELECTRONIC MATERIALS USA CORP. (DE) 2008-04-10 WO claimed
US-20080085463-A1 PHOTOACTIVE COMPOUNDS AZ ELECTRONICS MATERIALS USA CORP. 2008-04-10 US claimed
US-20070015084-A1 Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity MERCK PATENT GMBH (DE) 2007-01-18 US claimed
US-9146467-B2 Coating compositions MERCK PATENT GMBH (DE) 2015-09-29 US disclosed
US-20130236833-A1 COATING COMPOSITIONS AZ ELECTRONIC MATERIALS USA CORP. (US) 2013-09-12 US disclosed
US-8455176-B2 Coating composition AZ ELECTRONIC MATERIALS USA CORP. (US) 2013-06-04 US disclosed
US-8252503-B2 Photoresist compositions AZ ELECTRONIC MATERIALS USA CORP. (US) 2012-08-28 US disclosed
EP-2078028-B1 PHOTOACTIVE COMPOUNDS AZ ELECTRONIC MATERIALS USA (US) 2011-09-07 EP disclosed
US-20100119972-A1 COATING COMPOSITION MERCK PATENT GMBH (DE) 2010-05-13 US disclosed
EP-2121783-A1 POLYMERS USEFUL IN PHOTORESIST COMPOSITIONS AND COMPOSITIONS THEREOF AZ Electronic Materials USA Corp. (US) 2009-11-25 EP disclosed
EP-2078028-A1 PHOTOACTIVE COMPOUNDS AZ Electronic Materials USA Corp. (US) 2009-07-15 EP disclosed
US-7547501-B2 Photoactive compounds AZ ELECTRONIC MATERIALS USA CORP. (US) 2009-06-16 US disclosed
US-20090053652-A1 PHOTORESIST COMPOSITIONS MERCK PATENT GMBH (DE) 2009-02-26 US disclosed
US-20080187868-A1 Photoactive Compounds AZ ELECTRONIC MATERIALS USA CORP. 2008-08-07 US disclosed
WO-2008087549-A1 POLYMERS USEFUL IN PHOTORESIST COMPOSITIONS AND COMPOSITIONS THEREOF AZ ELECTRONIC MATERIALS USA CORP. (DE) 2008-07-24 WO disclosed
US-20080171270-A1 Polymers Useful in Photoresist Compositions and Compositions Thereof AZ ELECTRONIC MATERIALS USA CORP. 2008-07-17 US disclosed
WO-2008041123-A1 PHOTOACTIVE COMPOUNDS AZ ELECTRONIC MATERIALS USA CORP. (DE) 2008-04-10 WO disclosed
WO-2008041123-A1 PHOTOACTIVE COMPOUNDS AZ ELECTRONIC MATERIALS USA CORP. (DE) 2008-04-10 WO disclosed
US-20080085463-A1 PHOTOACTIVE COMPOUNDS AZ ELECTRONICS MATERIALS USA CORP. 2008-04-10 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20080131811-A1 Photoactive Compounds PRXL2A, PRDX2, AOC2 NR5A1 2878/4885TSHR 3855/4885TP53 4061/4885
US-20080131810-A1 Photoactive Compounds CRY2, AOC2, AFF2 NR5A1 2751/4885TSHR 3997/4885TP53 3946/4885
US-20080153032-A1 Photoactive Compounds SUN2, CRY2, SCO2 NR5A1 3953/4885TSHR 4095/4885TP53 4141/4885
US-20100119972-A1 COATING COMPOSITION S100A9, CAPG, C5 NR5A1 2170/4885TSHR 4827/4885TP53 3452/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.