Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.39 |
| ▸ | LMNA | P02545 | 2/20 | 0.38 |
| ▸ | TYR | P14679 | 1/20 | 0.38 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.37 |
| ▸ | MAPT | P10636 | 1/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.36 |
| ▸ | KIF11 | P52732 | 3/20 | 0.35 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.35 |
| ▸ | NR1H3 | Q13133 | 1/20 | 0.35 |
| ▸ | RAB9A | P51151 | 4/20 | 0.35 |
| ▸ | SRD5A2 | P31213 | 1/20 | 0.34 |
| ▸ | KCNK9 | Q9NPC2 | 1/20 | 0.34 |
| ▸ | ESR1 | P03372 | 2/20 | 0.33 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.33 |
| ▸ | NPC1 | O15118 | 2/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2437537 | 0.94 | TSHR (0.38) | TSHRLMNATYRL3MBTL1MAPT | |
| SCHEMBL244777 | 0.94 | TSHR (0.44) | TSHRLMNATYRL3MBTL1MAPT | |
| SCHEMBL107752 | 0.94 | TSHR (0.44) | TSHRLMNATYRL3MBTL1MAPT | |
| Bromide SCHEMBL3742452 | 0.91 | TSHR (0.42) | TSHRLMNATYRL3MBTL1MAPT | |
| Iodide SCHEMBL5461188 | 0.91 | TSHR (0.42) | TSHRLMNATYRL3MBTL1MAPT | |
| Bromide SCHEMBL482438 | 0.91 | TSHR (0.42) | TSHRLMNATYRL3MBTL1MAPT | |
| Hydrochloric Acid SCHEMBL3748986 | 0.91 | TSHR (0.42) | TSHRLMNATYRL3MBTL1MAPT | |
| Water SCHEMBL7702884 | 0.91 | TSHR (0.42) | TSHRLMNATYRL3MBTL1MAPT | |
| Ethane SCHEMBL4602786 | 0.91 | TSHR (0.42) | TSHRLMNATYRL3MBTL1MAPT | |
| Bromide SCHEMBL3132525 | 0.91 | TSHR (0.42) | TSHRLMNATYRL3MBTL1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 38 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2078028-B1 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIALS USA (US) | 2011-09-07 | — | — | EP | claimed |
| EP-2121783-A1 | POLYMERS USEFUL IN PHOTORESIST COMPOSITIONS AND COMPOSITIONS THEREOF | AZ Electronic Materials USA Corp. (US) | 2009-11-25 | — | — | EP | claimed |
| US-7601480-B2 | Photoactive compounds | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2009-10-13 | — | — | US | claimed |
| EP-2102184-A2 | PHOTOACTIVE COMPOUNDS | AZ Electronic Materials USA Corp. (US) | 2009-09-23 | — | — | EP | claimed |
| EP-2102156-A2 | PHOTOACTIVE COMPOUNDS | AZ Electronic Materials USA Corp. (US) | 2009-09-23 | — | — | EP | claimed |
| EP-2078028-A1 | PHOTOACTIVE COMPOUNDS | AZ Electronic Materials USA Corp. (US) | 2009-07-15 | — | — | EP | claimed |
| US-7521170-B2 | Photoactive compounds | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2009-04-21 | — | — | US | claimed |
| US-20090087782-A1 | Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity | MERCK PATENT GMBH (DE) | 2009-04-02 | — | — | US | claimed |
| US-7491482-B2 | Photoactive compounds | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2009-02-17 | — | — | US | claimed |
| WO-2008087549-A1 | POLYMERS USEFUL IN PHOTORESIST COMPOSITIONS AND COMPOSITIONS THEREOF | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2008-07-24 | — | — | WO | claimed |
| US-20080153032-A1 | Photoactive Compounds | MERCK PATENT GMBH (DE) | 2008-06-26 | — | — | US | claimed |
| US-7390613-B1 | Photoactive compounds | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2008-06-24 | — | — | US | claimed |
| WO-2008068617-A2 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2008-06-12 | — | — | WO | claimed |
| WO-2008068610-A2 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2008-06-12 | — | — | WO | claimed |
| US-20080131811-A1 | Photoactive Compounds | MERCK PATENT GMBH (DE) | 2008-06-05 | — | — | US | claimed |
| US-20080131810-A1 | Photoactive Compounds | MERCK PATENT GMBH (DE) | 2008-06-05 | — | — | US | claimed |
| EP-1915360-A2 | PHOTOACTIVE COMPOUNDS | AZ Electronic Materials USA Corp. (US) | 2008-04-30 | — | — | EP | claimed |
| WO-2008041123-A1 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2008-04-10 | — | — | WO | claimed |
| WO-2007007175-A2 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIAL USA CORP. (DE) | 2007-01-18 | — | — | WO | claimed |
| EP-2384457-B1 | COATING COMPOSITIONS | MERCK PATENT GMBH (DE) | 2022-07-06 | — | — | EP | disclosed |
| US-9146467-B2 | Coating compositions | MERCK PATENT GMBH (DE) | 2015-09-29 | — | — | US | disclosed |
| US-20130236833-A1 | COATING COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2013-09-12 | — | — | US | disclosed |
| US-8252503-B2 | Photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2012-08-28 | — | — | US | disclosed |
| EP-2384457-A2 | COATING COMPOSITIONS | AZ Electronic Materials USA Corp. (US) | 2011-11-09 | — | — | EP | disclosed |
| EP-2078028-B1 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIALS USA (US) | 2011-09-07 | — | — | EP | disclosed |
| EP-2197924-A2 | POLYMERS FOR USE IN PHOTORESIST COMPOSITIONS | AZ Electronic Materials USA Corp. (US) | 2010-06-23 | — | — | EP | disclosed |
| WO-2010055406-A2 | COATING COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2010-05-20 | — | — | WO | disclosed |
| EP-2121783-A1 | POLYMERS USEFUL IN PHOTORESIST COMPOSITIONS AND COMPOSITIONS THEREOF | AZ Electronic Materials USA Corp. (US) | 2009-11-25 | — | — | EP | disclosed |
| EP-2111567-A2 | PHOTORESIST COMPOSITION | AZ Electronic Materials USA Corp. (US) | 2009-10-28 | — | — | EP | disclosed |
| EP-2078028-A1 | PHOTOACTIVE COMPOUNDS | AZ Electronic Materials USA Corp. (US) | 2009-07-15 | — | — | EP | disclosed |
| US-20090087782-A1 | Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity | MERCK PATENT GMBH (DE) | 2009-04-02 | — | — | US | disclosed |
| WO-2009027794-A2 | POLYMERS FOR USE IN PHOTORESIST COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2009-03-05 | — | — | WO | disclosed |
| US-20090053652-A1 | PHOTORESIST COMPOSITIONS | MERCK PATENT GMBH (DE) | 2009-02-26 | — | — | US | disclosed |
| WO-2008096263-A2 | PHOTORESIST COMPOSITION | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2008-08-14 | — | — | WO | disclosed |
| WO-2008087549-A1 | POLYMERS USEFUL IN PHOTORESIST COMPOSITIONS AND COMPOSITIONS THEREOF | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2008-07-24 | — | — | WO | disclosed |
| EP-1915360-A2 | PHOTOACTIVE COMPOUNDS | AZ Electronic Materials USA Corp. (US) | 2008-04-30 | — | — | EP | disclosed |
| WO-2008041123-A1 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2008-04-10 | — | — | WO | disclosed |
| WO-2007007175-A2 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIAL USA CORP. (DE) | 2007-01-18 | — | — | WO | disclosed |
| WO-2007007175-A2 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIAL USA CORP. (DE) | 2007-01-18 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20080131811-A1 | Photoactive Compounds | PRXL2A, PRDX2, AOC2 | TSHR 3855/4885LMNA 1844/4885TYR 40/4885 |
| US-20080131810-A1 | Photoactive Compounds | CRY2, AOC2, AFF2 | TSHR 3997/4885LMNA 1568/4885TYR 34/4885 |
| US-20080153032-A1 | Photoactive Compounds | SUN2, CRY2, SCO2 | TSHR 4095/4885LMNA 3487/4885TYR 693/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.