SCHEMBL24371991

SCHEMBL24371991

CC(C)C1C(=O)N(S(=O)(=O)C(F)(F)F)C(=O)C1C(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25468261 0.77 — —
SCHEMBL23473547 0.73 — —
SCHEMBL19049846 0.72 — —
SCHEMBL10186366 0.65 ALDH1A1 (0.50) —
SCHEMBL12056175 0.63 ADRA2C (0.30) —
SCHEMBL24908746 0.63 MGLL (0.35) —
SCHEMBL28973879 0.63 PARL (0.39) —
SCHEMBL12534604 0.61 CYP19A1 (0.30) —
SCHEMBL16770362 0.61 ALDH1A1 (0.34) —
SCHEMBL4407323 0.61 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3988543-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD FUJIFILM Corporation (JP) 2022-04-27 — — EP disclosed
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