SCHEMBL24445865

SCHEMBL24445865

CC(=O)Oc1c(F)ccc(O)c1F

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KDM4E B2RXH2 2/20 0.41
▸ HSD17B10 Q99714 2/20 0.41
▸ HTT P42858 2/20 0.41
▸ CYP4F2 P78329 1/20 0.41
▸ CYP4A11 Q02928 1/20 0.41
▸ TP53 P04637 1/20 0.41
▸ GAA P10253 1/20 0.41
▸ MAPT P10636 1/20 0.41
▸ PREP P48147 3/20 0.41
▸ CELA1 Q9UNI1 2/20 0.41
▸ PIM1 P11309 1/20 0.39
▸ ABCB11 O95342 1/20 0.37
▸ CES2 O00748 1/20 0.36
▸ CES1 P23141 1/20 0.36
▸ MAPK1 P28482 1/20 0.36
▸ ALDH1A1 P00352 1/20 0.36
▸ HPGD P15428 1/20 0.36
▸ KDR P35968 1/20 0.36
▸ LMNA P02545 1/20 0.35
▸ CYP3A4 P08684 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2003057 0.86 CES2 (0.45) KDM4EHSD17B10HTTCYP4F2CYP4A11
SCHEMBL24436819 0.85 KDM4E (0.41) KDM4EHSD17B10HTTCYP4F2CYP4A11
SCHEMBL3128945 0.81 KDM4E (0.43) KDM4EHSD17B10HTTCYP4F2CYP4A11
SCHEMBL24436818 0.80 PREP (0.47) KDM4EHSD17B10HTTCYP4F2CYP4A11
SCHEMBL20210949 0.79 ABCB11 (0.42) KDM4EHSD17B10CYP4F2CYP4A11PREP
SCHEMBL20045615 0.79 CYP4F2 (0.40) KDM4EHSD17B10HTTCYP4F2CYP4A11
SCHEMBL6693436 0.78 KDM4E (0.49) KDM4EHSD17B10CYP4F2CYP4A11GAA
SCHEMBL5743633 0.78 TUBB4A (0.45) HTTCYP4F2CYP4A11ABCB11MAPK1
SCHEMBL24436699 0.77 KDM4E (0.45) KDM4EHSD17B10HTTCYP4F2CYP4A11
SCHEMBL24436807 0.77 KDM4E (0.41) KDM4EHSD17B10HTTCYP4F2CYP4A11

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4001336-A1 POLYURETHANE, POLYURETHANE PRODUCTION METHOD, CONDUCTIVE PASTE COMPOSITION, CONDUCTIVE WIRE, AND METHOD FOR PRODUCING CONDUCTIVE WIRE Shin-Etsu Chemical Co., Ltd. (JP) 2022-05-25 — — EP disclosed
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