SCHEMBL16893285

SCHEMBL16893285

N#CCC1CC2CC(O)C1C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9650398 0.73 GBA1 (0.33) —
SCHEMBL9650404 0.73 GBA1 (0.33) —
SCHEMBL4892113 0.71 CYP2C9 (0.48) —
SCHEMBL15923504 0.70 GLB1 (0.31) —
SCHEMBL24506594 0.68 — —
SCHEMBL1879862 0.68 — —
SCHEMBL19910085 0.67 — —
SCHEMBL18434941 0.67 — —
SCHEMBL23974113 0.66 ALDH1A1 (0.33) —
SCHEMBL15043780 0.66 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9488914-B2 Fluorine-containing sulfonic acid salt, fluorine-containing sulfonic acid salt resin, resist composition, and pattern forming method using same CENTRAL GLASS COMPANY, LIMITED (JP) 2016-11-08 — — US disclosed
US-20150198879-A1 Fluorine-Containing Sulfonic Acid Salt, Fluorine-Containing Sulfonic Acid Salt Resin, Resist Composition, and Pattern Forming Method Using Same CENTRAL GLASS COMPANY, LIMITED (JP) 2015-07-16 — — US disclosed
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