SCHEMBL245080

SCHEMBL245080

O=C(O)c1ccnc(O)c1O

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 7/20 0.48
ASPH Q12797 1/20 0.48
KDM8 Q8N371 1/20 0.48
ALDH1A1 P00352 4/20 0.47
L3MBTL1 Q9Y468 3/20 0.47
KDM4A O75164 2/20 0.47
RAB9A P51151 1/20 0.47
EGLN1 Q9GZT9 1/20 0.47
HIF1AN Q9NWT6 1/20 0.47
SELL P14151 1/20 0.46
SELP P16109 1/20 0.46
TDP1 Q9NUW8 2/20 0.43
MAPT P10636 2/20 0.42
ALB P02768 1/20 0.42
CYP3A4 P08684 1/20 0.42
ALOX15 P16050 1/20 0.42
TSHR P16473 1/20 0.42
BLM P54132 1/20 0.42
AGER Q15109 1/20 0.42
NPSR1 Q6W5P4 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19857460 0.80 KDM4E (0.62) KDM4EASPHKDM8ALDH1A1L3MBTL1
SCHEMBL19857476 0.80 KDM4E (0.52) KDM4EASPHKDM8ALDH1A1L3MBTL1
SCHEMBL17472117 0.80 KDM4E (0.68) KDM4EASPHKDM8ALDH1A1L3MBTL1
SCHEMBL10579491 0.80 KDM4E (0.49) KDM4EASPHKDM8ALDH1A1L3MBTL1
SCHEMBL28361885 0.78 NAPRT (0.57) KDM4EASPHKDM8ALDH1A1L3MBTL1
SCHEMBL2221901 0.78 KDM4E (0.48) KDM4EASPHKDM8ALDH1A1L3MBTL1
SCHEMBL1767848 0.78 KDM4E (0.46) KDM4EASPHKDM8ALDH1A1L3MBTL1
SCHEMBL5355672 0.78 NAPRT (0.57) KDM4EASPHKDM8ALDH1A1L3MBTL1
SCHEMBL31270462 0.74 LMNA (0.47) KDM4EASPHKDM8ALDH1A1L3MBTL1
SCHEMBL27888702 0.74 KDM4E (0.43) KDM4EASPHKDM8ALDH1A1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12077680-B2 Polishing composition, production method of the same, polishing method and a manufacturing method of a semiconductor substrate FUJIMI INCORPORATED (JP) 2024-09-03 US claimed
US-20210301174-A1 POLISHING COMPOSITION, PRODUCTION METHOD OF THE SAME, POLISHING METHOD AND A MANUFACTURING METHOD OF A SEMICONDUCTOR SUBSTRATE FUJIMI INCORPORATED (JP) 2021-09-30 US claimed
US-20030022390-A1 Method and kit for making interfering substances in urine undetectable SPECTRUM LABORATORIES INC. 2003-01-30 US claimed
EP-0300461-A2 Aromatic heterocyclic peroxyacids AUSIMONT S.p.A. (IT) 1989-01-25 EP claimed
US-12077680-B2 Polishing composition, production method of the same, polishing method and a manufacturing method of a semiconductor substrate FUJIMI INCORPORATED (JP) 2024-09-03 US disclosed
US-20210301174-A1 POLISHING COMPOSITION, PRODUCTION METHOD OF THE SAME, POLISHING METHOD AND A MANUFACTURING METHOD OF A SEMICONDUCTOR SUBSTRATE FUJIMI INCORPORATED (JP) 2021-09-30 US disclosed
CN-106967213-B Eight-arm polyethylene glycol, preparation method, functionalized derivative and modified biologically-relevant substance 厦门赛诺邦格生物科技股份有限公司 2019-11-05 CN disclosed
US-20120004349-A1 Epoxy resin composition, curing agent, and curing accelerator NIPPON SODA CO., LTD. 2012-01-05 US disclosed
US-20030022390-A1 Method and kit for making interfering substances in urine undetectable SPECTRUM LABORATORIES INC. 2003-01-30 US disclosed
US-4346076-A Bis-tetrazoylmethyl substituted cephalosporin antibiotics ELI LILLY AND COMPANY (US) 1982-08-24 US disclosed
EP-0048165-A1 Bis-tetrazolemethyl substituted beta-lactam antibiotics, their preparation and pharmaceutical formulations containing them ELI LILLY AND COMPANY (US) 1982-03-24 EP disclosed
EP-0048169-A2 Bis-tetrazoylmethyl substituted cephalosporin antibiotics, their preparation and pharmaceutical formulations containing them ELI LILLY AND COMPANY (US) 1982-03-24 EP disclosed
US-4304774-A Bis-tetrazolmethyl substituted β-lactam antibiotics ELI LILLY AND COMPANY (US) 1981-12-08 US disclosed
US-4207320-A FUNGICIDES WARNER-LAMBERT COMPANY (US) 1980-06-10 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120004349-A1 Epoxy resin composition, curing agent, and curing accelerator DCTN1, ARCN1, UNC119 KDM4E 206/4885ASPH 2125/4885KDM8 48/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.