SCHEMBL2452597

SCHEMBL2452597

O=C1CC(c2ccccc2)c2cc(-c3ccccc3)ccc21

nearest known ligand 0.64

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 2/20 0.55
EEF2K O00418 1/20 0.46
CFTR P13569 1/20 0.44
GOPC Q9HD26 1/20 0.44
MEN1 O00255 2/20 0.43
NPC1 O15118 2/20 0.43
MAPT P10636 2/20 0.43
KMT2A Q03164 2/20 0.43
SMN1; SMN2 Q16637 2/20 0.43
APAF1 O14727 1/20 0.43
LMNA P02545 1/20 0.43
THRB P10828 1/20 0.43
XBP1 P17861 1/20 0.43
PTBP1 P26599 1/20 0.43
HTT P42858 1/20 0.43
RAB9A P51151 1/20 0.43
GALK1 P51570 1/20 0.43
BLM P54132 1/20 0.43
SMAD3 P84022 1/20 0.43
ATM Q13315 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12121778 0.80 KDM4E (0.59) KDM4EEEF2KALDH1A1ALDH2GAA
SCHEMBL6146090 0.80 KDM4E (0.59) KDM4EEEF2KALDH1A1ALDH2GAA
SCHEMBL5612911 0.80 KDM4E (0.55) KDM4EEEF2KALDH1A1HPGDALDH2
SCHEMBL6146093 0.80 KDM4E (0.59) KDM4EEEF2KALDH1A1ALDH2GAA
SCHEMBL181713 0.78 KDM4E (0.56) KDM4EEEF2KCFTRGOPCMAPT
SCHEMBL29657292 0.78 KDM4E (0.56) KDM4EEEF2KCFTRGOPCMAPT
SCHEMBL8873657 0.78 KDM4E (0.56) KDM4EEEF2KCFTRGOPCMAPT
SCHEMBL9489554 0.78 EDNRB (0.47) KDM4EMEN1NPC1MAPTKMT2A
SCHEMBL10069666 0.76 KDM4E (0.55) KDM4EEEF2KNPC1MAPTRAB9A
SCHEMBL570649 0.76 KDM4E (0.67) KDM4ELMNAALDH1A1GAAMAOB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8252512-B2 Epoxy compound, alkali-developable resin composition, and alkali-developable photosensitive resin composition ADEKA CORPORATION (JP) 2012-08-28 US disclosed
EP-2145880-B1 NOVEL EPOXY COMPOUND, ALKALI-DEVELOPABLE RESIN COMPOSITION, AND ALKALI-DEVELOPABLE PHOTOSENSITIVE RESIN COMPOSITION ADEKA CORP (JP) 2011-09-28 EP disclosed
US-20100015551-A1 NOVEL EPOXY COMPOUND, ALKALI-DEVELOPABLE RESIN COMPOSITION, AND ALKALI-DEVELOPABLE PHOTOSENSITIVE RESIN COMPOSITION ADEKA CORPORATION (JP) 2010-01-21 US disclosed
EP-2145880-A1 NOVEL EPOXY COMPOUND, ALKALI-DEVELOPABLE RESIN COMPOSITION, AND ALKALI-DEVELOPABLE PHOTOSENSITIVE RESIN COMPOSITION Adeka Corporation (JP) 2010-01-20 EP disclosed