⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23600002 | 0.71 | — | — | |
| SCHEMBL24116355 | 0.57 | — | — | |
| SCHEMBL15147151 | 0.48 | — | — | |
| SCHEMBL14001999 | 0.48 | — | — | |
| SCHEMBL576474 | 0.48 | LMNA (0.38) | — | |
| SCHEMBL19249994 | 0.47 | MAPT (0.31) | — | |
| SCHEMBL16743494 | 0.47 | MAPT (0.31) | — | |
| SCHEMBL9790256 | 0.47 | — | — | |
| SCHEMBL576921 | 0.45 | HTR7 (0.39) | — | |
| SCHEMBL441723 | 0.45 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20220197140-A1 | ALCOHOL COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-06-23 | — | — | US | disclosed |