SCHEMBL24533730

SCHEMBL24533730

CC(C)(O)c1cc(OCCOCCOc2cc(C(C)(C)O)cc(C(C)(C)O)c2)cc(C(C)(C)O)c1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ HRH3 Q9Y5N1 2/20 0.37
▸ TDP1 Q9NUW8 4/20 0.37
▸ KDM4E B2RXH2 3/20 0.37
▸ MAPK1 P28482 1/20 0.37
▸ LMNA P02545 3/20 0.36
▸ SMN1; SMN2 Q16637 4/20 0.34
▸ MAPT P10636 4/20 0.34
▸ MEN1 O00255 3/20 0.34
▸ TSHR P16473 3/20 0.34
▸ KMT2A Q03164 3/20 0.34
▸ ALDH1A1 P00352 3/20 0.34
▸ CYP3A4 P08684 3/20 0.34
▸ APAF1 O14727 2/20 0.34
▸ USP2 O75604 2/20 0.34
▸ ERBB2 P04626 2/20 0.34
▸ TP53 P04637 2/20 0.34
▸ FYN P06241 2/20 0.34
▸ CHRM2 P08172 2/20 0.34
▸ CHRM4 P08173 2/20 0.34
▸ CHRM5 P08912 2/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24533712 0.80 HRH3 (0.55) HRH3TDP1KDM4EMAPK1LMNA
SCHEMBL9270383 0.79 NQO1 (0.42) TDP1KDM4EMAPTTSHRCYP3A4
SCHEMBL24533749 0.78 HRH3 (0.32) HRH3MAPTALDH1A1
SCHEMBL24533738 0.76 MAOB (0.38) MEN1KMT2A
SCHEMBL18802918 0.74 APP (0.46) MEN1KMT2A
SCHEMBL24564761 0.74 HRH3 (0.30) HRH3
SCHEMBL5950375 0.73 ALDH1A1 (0.50) KDM4ESMN1; SMN2MAPTMEN1KMT2A
SCHEMBL548426 0.73 GABRA1 (0.35) MAPK1MAPTALDH1A1NPC1RAB9A
SCHEMBL24116187 0.73 SMN1; SMN2 (0.56) LMNASMN1; SMN2MAPTALDH1A1
SCHEMBL16492983 0.73 CYP3A4 (0.41) HRH3KDM4ELMNASMN1; SMN2MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4258056-A2 ALCOHOL COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-11 — — EP disclosed
EP-4019489-A1 ALCOHOL COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-06-29 — — EP disclosed
US-20220197140-A1 ALCOHOL COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-06-23 — — US disclosed
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