Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RXRA | P19793 | 1/20 | 0.58 |
| ▸ | RXRB | P28702 | 1/20 | 0.58 |
| ▸ | APP | P05067 | 5/20 | 0.50 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.48 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.48 |
| ▸ | PARP10 | Q53GL7 | 1/20 | 0.47 |
| ▸ | F2 | P00734 | 1/20 | 0.47 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.47 |
| ▸ | PRSS2 | P07478 | 1/20 | 0.47 |
| ▸ | PRSS3 | P35030 | 1/20 | 0.47 |
| ▸ | TMPRSS6 | Q8IU80 | 1/20 | 0.47 |
| ▸ | ST14 | Q9Y5Y6 | 1/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11000264 | 0.91 | MAOB (0.58) | RXRARXRBAPPFFAR1 | |
| SCHEMBL1497960 | 0.91 | LMNA (0.61) | RXRARXRBALOX5 | |
| SCHEMBL6743494 | 0.88 | RXRA (0.49) | RXRARXRBAPPALOX5FFAR1 | |
| SCHEMBL9124643 | 0.87 | MAOB (0.54) | RXRARXRBAPPFFAR1 | |
| SCHEMBL9121973 | 0.86 | ACACB (0.60) | ALOX5FFAR1 | |
| Biphenyl SCHEMBL9839827 | 0.85 | ACACB (0.59) | ALOX5FFAR1 | |
| SCHEMBL13160063 | 0.83 | RXRA (0.72) | RXRARXRBAPP | |
| SCHEMBL12279053 | 0.83 | RXRA (0.72) | RXRARXRBAPP | |
| SCHEMBL9126010 | 0.82 | NR5A1 (0.53) | RXRARXRB | |
| SCHEMBL17602110 | 0.81 | ALOX5 (0.53) | ALOX5 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4258056-A2 | ALCOHOL COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-11 | — | — | EP | disclosed |
| US-20220197140-A1 | ALCOHOL COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-06-23 | — | — | US | disclosed |