Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 5/20 | 0.50 |
| ▸ | HSD17B10 | Q99714 | 5/20 | 0.50 |
| ▸ | ALOX15 | P16050 | 5/20 | 0.50 |
| ▸ | LMNA | P02545 | 4/20 | 0.50 |
| ▸ | HIF1A | Q16665 | 4/20 | 0.50 |
| ▸ | MEN1 | O00255 | 4/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.50 |
| ▸ | MAPT | P10636 | 3/20 | 0.50 |
| ▸ | TYR | P14679 | 2/20 | 0.50 |
| ▸ | HPGD | P15428 | 2/20 | 0.50 |
| ▸ | CA3 | P07451 | 2/20 | 0.50 |
| ▸ | CA14 | Q9ULX7 | 2/20 | 0.50 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.50 |
| ▸ | NPC1 | O15118 | 1/20 | 0.50 |
| ▸ | CA12 | O43570 | 1/20 | 0.50 |
| ▸ | GMNN | O75496 | 1/20 | 0.50 |
| ▸ | CA1 | P00915 | 1/20 | 0.50 |
| ▸ | CA2 | P00918 | 1/20 | 0.50 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL11662665 | 0.97 | CYP3A4 (0.47) | CYP3A4HSD17B10ALOX15LMNAHIF1A | |
| SCHEMBL30217812 | 0.89 | CYP3A4 (0.40) | CYP3A4HSD17B10ALOX15LMNAHIF1A | |
| Perchlorate SCHEMBL9574136 | 0.89 | LMNA (0.40) | CYP3A4HSD17B10ALOX15LMNAHIF1A | |
| SCHEMBL29843423 | 0.89 | CYP3A4 (0.40) | CYP3A4HSD17B10ALOX15LMNAHIF1A | |
| Sulfuric Acid SCHEMBL3625676 | 0.87 | HPGD (0.50) | CYP3A4HSD17B10ALOX15LMNAHIF1A | |
| Sulfuric Acid SCHEMBL3625673 | 0.85 | ENPP2 (0.48) | CYP3A4HSD17B10ALOX15LMNAHIF1A | |
| SCHEMBL29714721 | 0.83 | ENPP2 (0.52) | CYP3A4HSD17B10ALOX15LMNAHIF1A | |
| Sulfuric Acid SCHEMBL3625678 | 0.83 | LMNA (0.48) | CYP3A4HSD17B10ALOX15LMNAHIF1A | |
| SCHEMBL9336595 | 0.82 | ENPP2 (0.35) | CYP3A4HSD17B10ALOX15LMNAHIF1A | |
| SCHEMBL12934400 | 0.81 | CYP3A4 (0.50) | CYP3A4HSD17B10ALOX15LMNAHIF1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1323 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4607278-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | Ycchem Co., Ltd. (KR) | 2025-08-27 | — | — | EP | claimed |
| US-20250199405-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | YCCHEM CO., LTD. (KR) | 2025-06-19 | — | — | US | claimed |
| CN-119998727-A | Chemically amplified positive resist composition for improving pattern profile and enhancing etch resistance | YC化学制品株式会社 | 2025-05-13 | — | — | CN | claimed |
| WO-2024085293-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | 영창케미칼 주식회사 | 2024-04-25 | — | — | WO | claimed |
| US-20180031912-A1 | METHODS OF FABRICATING QUANTUM DOT COLOR FILM SUBSTRATES | SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO. | 2018-02-01 | — | — | US | claimed |
| US-9075306-B2 | Chemically amplified negative resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-07 | — | — | US | claimed |
| EP-1710230-B1 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2013-08-14 | — | — | EP | claimed |
| CN-101034260-B | Photosensitive resin composition | DONGJIN SEMICOHEM CO LTD | 2012-07-18 | — | — | CN | claimed |
| EP-1780199-B1 | Novel fluorohydroxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2012-02-01 | — | — | EP | claimed |
| EP-1780198-B1 | Novel fluorosulfonyloxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2011-10-05 | — | — | EP | claimed |
| US-6991888-B2 | Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2006-01-31 | — | — | US | claimed |
| EP-1516229-A2 | PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LITHOGRAPHY COMPRISING A MIXTURE OF PHOTOACTIVE COMPOUNDS | AZ Electronic Materials USA Corp. (US) | 2005-03-23 | — | — | EP | claimed |
| US-20030235782-A1 | Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds | MERCK PATENT GMBH (DE) | 2003-12-25 | — | — | US | claimed |
| US-20030235775-A1 | Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds | CLARIANT INTERNATIONAL LTD (CH) | 2003-12-25 | — | — | US | claimed |
| WO-2003107093-A2 | PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LITHOGRAPHY COMPRISING A MIXTURE OF PHOTOACTIVE COMPOUNDS | CLARIANT INTERNATIONAL LTD (CH) | 2003-12-24 | — | — | WO | claimed |
| US-6440634-B1 | MICROFABRICATION OF INTEGRATED CIRCUITS, DEEP UV LITHOGRAPHY; PHENYLSULFONATE SALTS OF SULFONIUM OR IODINIUM CATIONS | SHIN-ETSU CHEMICAL CO., LTD (JP) | 2002-08-27 | — | — | US | claimed |
| EP-0346756-B1 | PROCESS FOR PRODUCTION OF SULFONIUM COMPOUNDS | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1992-10-28 | — | — | EP | claimed |
| EP-0245662-B1 | P-HYDROXYPHENYLSULFONIUM SALTS AND THEIR USE IN THE PREPARATION OF ESTERS AND AMIDES | SANSHIN KAGAKU KOGYO CO., LTD. (JP) | 1991-08-07 | — | — | EP | claimed |
| EP-0331988-A1 | Sulfonium compounds, as well as process for producing active esters and amides used for the production of amides | SANSHIN KAGAKU KOGYO CO., LTD. (JP) | 1989-09-13 | — | — | EP | claimed |
| EP-0245662-A1 | p-Hydroxyphenylsulfonium salts and their use in the preparation of esters and amides | SANSHIN KAGAKU KOGYO CO., LTD. (JP) | 1987-11-19 | — | — | EP | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20030235782-A1 | Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds | SUN2, UROD, ERCC1 | CYP3A4 2464/4885HSD17B10 3170/4885ALOX15 930/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.