Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PRKCE | Q02156 | 3/20 | 0.43 |
| ▸ | MYLK | Q15746 | 2/20 | 0.43 |
| ▸ | MEN1 | O00255 | 1/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.43 |
| ▸ | PRKCG | P05129 | 1/20 | 0.43 |
| ▸ | MAPT | P10636 | 1/20 | 0.43 |
| ▸ | PRKCA | P17252 | 1/20 | 0.43 |
| ▸ | APEX1 | P27695 | 1/20 | 0.43 |
| ▸ | RECQL | P46063 | 1/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.43 |
| ▸ | ESR1 | P03372 | 2/20 | 0.41 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.41 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.34 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.34 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.34 |
| ▸ | HTT | P42858 | 1/20 | 0.34 |
| ▸ | PDK2 | Q15119 | 1/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19410118 | 0.93 | PRKCE (0.41) | PRKCEMYLKMEN1ALDH1A1PRKCG | |
| SCHEMBL12937583 | 0.91 | PRKCE (0.37) | PRKCEMYLKMEN1ALDH1A1PRKCG | |
| SCHEMBL2469069 | 0.89 | PRKCE (0.41) | PRKCEMYLKMEN1ALDH1A1PRKCG | |
| SCHEMBL16229483 | 0.87 | PRKCE (0.34) | PRKCEMYLKMEN1ALDH1A1PRKCG | |
| SCHEMBL2605572 | 0.87 | PRKCE (0.42) | PRKCEMYLKMEN1ALDH1A1PRKCG | |
| SCHEMBL14997930 | 0.85 | PRKCE (0.33) | PRKCEMYLKMEN1ALDH1A1PRKCG | |
| SCHEMBL2466676 | 0.82 | ESR1 (0.38) | MAPTESR1ESR2CYP2C19ALOX15 | |
| SCHEMBL28431024 | 0.82 | PRKCE (0.41) | PRKCEMYLKMEN1ALDH1A1PRKCG | |
| SCHEMBL2469693 | 0.80 | PTPN1 (0.40) | ESR1ESR2CYP2C19ALOX15MAPK1 | |
| SCHEMBL2464772 | 0.80 | ESR1 (0.36) | PRKCEALDH1A1ESR1ESR2CYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8852726-B2 | Photosensitive polymer composition, method of producing pattern and electronic parts | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) | 2014-10-07 | — | — | US | claimed |
| US-20120263920-A1 | Photosensitive Polymer Composition, Method of Producing Pattern and Electronic Parts | OOE MASAYUKI (JP) | 2012-10-18 | — | — | US | claimed |
| US-8231959-B2 | Photosensitive polymer composition, method of producing pattern and electronic parts | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) | 2012-07-31 | — | — | US | claimed |
| EP-1708026-B1 | PHOTOSENSITIVE POLYMER COMPOSITION, PROCESS FOR PRODUCING PATTERN, AND ELECTRONIC PART | HITACHI CHEM DUPONT MICROSYS (JP) | 2011-10-05 | — | — | EP | claimed |
| US-20080220222-A1 | Photosensitive Polymer Composition, Method of Producing Pattern and Electronic Parts | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) | 2008-09-11 | — | — | US | claimed |
| EP-1708026-A1 | PHOTOSENSITIVE POLYMER COMPOSITION, PROCESS FOR PRODUCING PATTERN, AND ELECTRONIC PART | Hitachi Chemical DuPont Microsystems Ltd. (JP) | 2006-10-04 | — | — | EP | claimed |
| CN-114436910-B | Diazonaphthoquinone sulfonate compound and resin composition | 北京鼎材科技有限公司 | 2024-01-26 | — | — | CN | disclosed |
| CN-111848954-B | Modified polyimide precursor resin, photosensitive resin composition and application thereof | 北京鼎材科技有限公司 | 2023-10-17 | — | — | CN | disclosed |
| US-11725076-B2 | Polymer for formation of resist underlayer film, composition for formation of resist underlayer film comprising same and method for manufacturing semiconductor element by using same | SK INNOVATION CO., LTD. (KR) | 2023-08-15 | — | — | US | disclosed |
| US-11435667-B2 | Polymer for organic bottom anti-reflective coating and bottom anti-reflective coatings comprising the same | SK INNOVATION CO., LTD. (KR) | 2022-09-06 | — | — | US | disclosed |
| US-20200199288-A1 | Polymer For Formation of Resist Underlayer Film, Composition for Formation of Resist Underlayer Film Comprising Same and Method for Manufacturing Semiconductor Element by Using Same | SK GEO CENTRIC CO., LTD. (KR) | 2020-06-25 | — | — | US | disclosed |
| CN-107077070-B | Photosensitive resin composition, cured film, element provided with cured film, and method for manufacturing semiconductor device | 东丽株式会社 | 2020-06-16 | — | — | CN | disclosed |
| US-10409163-B2 | Photosensitive resin composition, cured film, element provided with cured film, and method for manufacturing semiconductor device | TORAY INDUSTRIES, INC. (JP) | 2019-09-10 | — | — | US | disclosed |
| US-20110008730-A1 | POSITIVE-TYPE RADIATION-SENSITIVE COMPOSITION, CURED FILM, INTERLAYER INSULATING FILM, METHOD OF FORMING INTERLAYER INSULATING FILM, DISPLAY DEVICE, AND SILOXANE POLYMER FOR FORMING INTERLAYER INSULATING FILM | JSR CORPORATION (JP) | 2011-01-13 | — | — | US | disclosed |
| US-20100266951-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-10-21 | — | — | US | disclosed |
| US-20100266951-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-10-21 | — | — | US | disclosed |
| US-20080220222-A1 | Photosensitive Polymer Composition, Method of Producing Pattern and Electronic Parts | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) | 2008-09-11 | — | — | US | disclosed |
| US-7374856-B2 | Positive type photo-sensitive siloxane composition, cured film formed from the composition and device incorporating the cured film | TORAY INDUSTRIES, INC. (JP) | 2008-05-20 | — | — | US | disclosed |
| US-7374856-B2 | Positive type photo-sensitive siloxane composition, cured film formed from the composition and device incorporating the cured film | TORAY INDUSTRIES, INC. (JP) | 2008-05-20 | — | — | US | disclosed |
| EP-1708026-A1 | PHOTOSENSITIVE POLYMER COMPOSITION, PROCESS FOR PRODUCING PATTERN, AND ELECTRONIC PART | Hitachi Chemical DuPont Microsystems Ltd. (JP) | 2006-10-04 | — | — | EP | disclosed |