Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTPN1 | P18031 | 1/20 | 0.40 |
| ▸ | ESR1 | P03372 | 2/20 | 0.36 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.35 |
| ▸ | NPC1 | O15118 | 1/20 | 0.35 |
| ▸ | BRD4 | O60885 | 1/20 | 0.35 |
| ▸ | MITF | O75030 | 1/20 | 0.35 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.35 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.31 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.31 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2466676 | 0.87 | ESR1 (0.38) | ESR1ESR2CYP2C19ALOX15MAPK1 | |
| SCHEMBL15000814 | 0.81 | PTPN1 (0.43) | PTPN1ESR1ESR2KDM4ENPC1 | |
| SCHEMBL17751463 | 0.81 | ALOX15 (0.49) | PTPN1ESR1ESR2KDM4ENPC1 | |
| SCHEMBL2463085 | 0.80 | PRKCE (0.43) | ESR1ESR2KDM4ECYP2C19ALOX15 | |
| SCHEMBL20958233 | 0.78 | ESR1 (0.38) | PTPN1ESR1ESR2CYP2C19ALOX15 | |
| SCHEMBL12151247 | 0.77 | PTPN1 (0.40) | PTPN1ESR1ESR2KDM4ENPC1 | |
| SCHEMBL14997931 | 0.77 | PTPN1 (0.40) | PTPN1ESR1ESR2KDM4ENPC1 | |
| SCHEMBL19484765 | 0.77 | PTPN1 (0.40) | PTPN1ESR1ESR2KDM4ENPC1 | |
| SCHEMBL20958248 | 0.77 | GABRA1 (0.46) | ESR1ESR2L3MBTL1CYP2C19ALOX15 | |
| SCHEMBL17751452 | 0.76 | ALOX15 (0.44) | PTPN1ESR1ESR2KDM4ENPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8852726-B2 | Photosensitive polymer composition, method of producing pattern and electronic parts | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) | 2014-10-07 | — | — | US | disclosed |
| US-20120263920-A1 | Photosensitive Polymer Composition, Method of Producing Pattern and Electronic Parts | OOE MASAYUKI (JP) | 2012-10-18 | — | — | US | disclosed |
| US-8231959-B2 | Photosensitive polymer composition, method of producing pattern and electronic parts | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) | 2012-07-31 | — | — | US | disclosed |
| EP-1708026-B1 | PHOTOSENSITIVE POLYMER COMPOSITION, PROCESS FOR PRODUCING PATTERN, AND ELECTRONIC PART | HITACHI CHEM DUPONT MICROSYS (JP) | 2011-10-05 | — | — | EP | disclosed |
| US-20080220222-A1 | Photosensitive Polymer Composition, Method of Producing Pattern and Electronic Parts | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) | 2008-09-11 | — | — | US | disclosed |
| EP-1708026-A1 | PHOTOSENSITIVE POLYMER COMPOSITION, PROCESS FOR PRODUCING PATTERN, AND ELECTRONIC PART | Hitachi Chemical DuPont Microsystems Ltd. (JP) | 2006-10-04 | — | — | EP | disclosed |