SCHEMBL2464772

SCHEMBL2464772

CC(=O)OCc1cc(C(c2cc(COC(C)=O)c(O)c(COC(C)=O)c2)(C(F)(F)F)C(F)(F)F)cc(COC(C)=O)c1O

nearest known ligand 0.36

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 1/20 0.36
ESR2 Q92731 1/20 0.36
KDM4E B2RXH2 2/20 0.36
HSD17B10 Q99714 2/20 0.36
ALDH1A1 P00352 3/20 0.36
CYP3A4 P08684 2/20 0.36
NOTUM Q6P988 1/20 0.32
PRKCE Q02156 1/20 0.31
CYP2C19 P33261 1/20 0.31
ALOX15 P16050 1/20 0.31
MAPK1 P28482 1/20 0.31
HTT P42858 1/20 0.31
FFAR4 Q5NUL3 1/20 0.30
PTGS2 P35354 1/20 0.30
TNKS2 Q9H2K2 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2463085 0.80 PRKCE (0.43) ESR1ESR2KDM4EALDH1A1PRKCE
SCHEMBL2605572 0.78 PRKCE (0.42) ESR1ESR2KDM4EALDH1A1CYP3A4
SCHEMBL20958248 0.77 GABRA1 (0.46) ESR1ESR2CYP3A4CYP2C19ALOX15
SCHEMBL2466676 0.77 ESR1 (0.38) ESR1ESR2CYP2C19ALOX15MAPK1
SCHEMBL7566203 0.75 ALDH1A1 (0.52) KDM4EHSD17B10ALDH1A1CYP3A4PRKCE
SCHEMBL2114303 0.75 ALDH1A1 (0.45) KDM4EHSD17B10ALDH1A1CYP3A4CYP2C19
SCHEMBL2469693 0.74 PTPN1 (0.40) ESR1ESR2KDM4ECYP2C19ALOX15
SCHEMBL19410118 0.73 PRKCE (0.41) ESR1ESR2KDM4EALDH1A1PRKCE
SCHEMBL6057810 0.73 ALDH1A1 (0.42) HSD17B10ALDH1A1CYP3A4CYP2C19MAPK1
Acetic Acid SCHEMBL9331113 0.73 ALDH1A1 (0.53) KDM4EHSD17B10ALDH1A1CYP3A4PRKCE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8852726-B2 Photosensitive polymer composition, method of producing pattern and electronic parts HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) 2014-10-07 US disclosed
US-20120263920-A1 Photosensitive Polymer Composition, Method of Producing Pattern and Electronic Parts OOE MASAYUKI (JP) 2012-10-18 US disclosed
US-8231959-B2 Photosensitive polymer composition, method of producing pattern and electronic parts HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) 2012-07-31 US disclosed
EP-1708026-B1 PHOTOSENSITIVE POLYMER COMPOSITION, PROCESS FOR PRODUCING PATTERN, AND ELECTRONIC PART HITACHI CHEM DUPONT MICROSYS (JP) 2011-10-05 EP disclosed
US-20080220222-A1 Photosensitive Polymer Composition, Method of Producing Pattern and Electronic Parts HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) 2008-09-11 US disclosed
EP-1708026-A1 PHOTOSENSITIVE POLYMER COMPOSITION, PROCESS FOR PRODUCING PATTERN, AND ELECTRONIC PART Hitachi Chemical DuPont Microsystems Ltd. (JP) 2006-10-04 EP disclosed