SCHEMBL2469796

SCHEMBL2469796

CCCCC(CCCC)=C(C)C(N)=O

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CES1 P23141 6/20 0.46
CES2 O00748 5/20 0.46
ALDH1A1 P00352 3/20 0.42
TP53 P04637 2/20 0.42
CA1 P00915 1/20 0.41
FAAH O00519 3/20 0.38
MEN1 O00255 2/20 0.38
KMT2A Q03164 2/20 0.38
CYP1A2 P05177 1/20 0.38
CYP3A4 P08684 1/20 0.38
CYP2C19 P33261 1/20 0.38
SOAT1 P35610 1/20 0.38
THRB P10828 1/20 0.38
FNTA P49354 1/20 0.38
FNTB P49356 1/20 0.38
PGGT1B P53609 1/20 0.38
AKR1B1 P15121 1/20 0.37
PPARG P37231 3/20 0.36
PPARD Q03181 3/20 0.36
PPARA Q07869 3/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10592271 0.93 CES2 (0.48) CES1CES2ALDH1A1TP53FAAH
SCHEMBL28784878 0.91 CES1 (0.43) CES1CES2ALDH1A1TP53CA1
SCHEMBL27647689 0.91 CES2 (0.50) CES1CES2ALDH1A1TP53FAAH
SCHEMBL27988309 0.91 CES2 (0.50) CES1CES2ALDH1A1TP53FAAH
SCHEMBL4085870 0.91 CES2 (0.50) CES1CES2ALDH1A1TP53FAAH
SCHEMBL250174 0.91 CES2 (0.50) CES1CES2ALDH1A1TP53FAAH
SCHEMBL3466717 0.91 CES2 (0.50) CES1CES2ALDH1A1TP53FAAH
SCHEMBL3467535 0.91 CES2 (0.50) CES1CES2ALDH1A1TP53FAAH
SCHEMBL29226159 0.89 CES1 (0.41) CES1CES2ALDH1A1TP53CA1
SCHEMBL28185283 0.87 CA1 (0.36) CES1CES2ALDH1A1TP53CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 72 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110998800-B Polishing liquid, polishing liquid set and polishing method 株式会社力森诺科 2023-09-22 CN disclosed
US-20220235172-A1 SILYLATED ADDUCTS, SILYLATED POLYMERS AND COMPOSITIONS COMPRISING SAME BOSTIK SA (FR) 2022-07-28 US disclosed
EP-3983419-A1 SILYLATED ADDUCTS, SILYLATED POLYMERS AND COMPOSITIONS COMPRISING SAME Bostik SA (FR) 2022-04-20 EP disclosed
CN-113939523-A Silylated adducts, silylated polymers, and compositions comprising the same 波士胶公司 2022-01-14 CN disclosed
CN-113573685-A Nonaqueous dispersion liquid, method for producing same, and cosmetic composition containing same 株式会社LG生活健康 2021-10-29 CN disclosed
WO-2020249901-A1 SILYLATED ADDUCTS, SILYLATED POLYMERS AND COMPOSITIONS COMPRISING SAME BOSTIK SA (FR) 2020-12-17 WO disclosed
CN-106463386-B Method for polishing silicon wafer, polishing composition, and polishing composition set 福吉米株式会社 2020-12-01 CN disclosed
CN-111433311-A Polishing liquid, polishing liquid set, polishing method, and defect suppression method 日立化成株式会社 2020-07-17 CN disclosed
CN-111040731-A Composition for polishing silicon wafer 福吉米株式会社 2020-04-21 CN disclosed
CN-110998800-A Polishing liquid, polishing liquid set and polishing method 日立化成株式会社 2020-04-10 CN disclosed
US-4764455-A Color image-forming process FUJI PHOTO FILM CO., LTD. (JP) 1988-08-16 US disclosed
EP-0215124-A1 SILVER HALIDE PHOTOGRAPHIC PHOTO-SENSITIVE MATERIAL FUJI PHOTO FILM CO., LTD. (JP) 1987-03-25 EP disclosed
EP-0033081-B1 ANIONIC COPOLYMERS CONTAINING POLYVALENT METAL CATIONS AND THEIR USE IN PHOTOGRAPHIC MATERIALS Agfa-Gevaert AG (DE) 1985-04-24 EP disclosed
EP-0048412-B1 PHOTOGRAPHIC MATERIAL WITH A TEMPORARY BARRIER LAYER Agfa-Gevaert AG (DE) 1984-06-20 EP disclosed
US-4426438-A Anionic copolymers containing polyvalent metal cations and their use in photographic materials AGFA-GEVAERT AKTIENGESELLSCHAFT (DE) 1984-01-17 US disclosed
EP-0048412-A1 Photographic material with a temporary barrier layer Agfa-Gevaert AG (DE) 1982-03-31 EP disclosed
EP-0033081-A1 Anionic copolymers containing polyvalent metal cations and their use in photographic materials Agfa-Gevaert AG (DE) 1981-08-05 EP disclosed
US-4275138-A Photosensitive diazonium compound containing composition and article with β-hydroxyalkyl acrylate or methacrylate FUJI PHOTO FILM CO., LTD. (JP) 1981-06-23 US disclosed
US-4178182-A ACRYLIC ESTER OF POLYOL USED AS POLYMERIZED INTERLAYER OR OVERCOAT, STORAGE STABILITY FUJI PHOTO FILM CO., LTD (JP) 1979-12-11 US disclosed
US-4020192-A AMINO ALKYL AMIDE ACRYLIC POLYMER FUJI XEROX CO., LTD. (JA) 1977-04-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20220235172-A1 SILYLATED ADDUCTS, SILYLATED POLYMERS AND COMPOSITIONS COMPRISING SAME OGG1, MGMT, UNG CES1 3151/4885CES2 1373/4885ALDH1A1 75/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.