Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES2 | O00748 | 3/20 | 0.50 |
| ▸ | CES1 | P23141 | 3/20 | 0.50 |
| ▸ | FAAH | O00519 | 3/20 | 0.48 |
| ▸ | MEN1 | O00255 | 2/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.48 |
| ▸ | TP53 | P04637 | 1/20 | 0.48 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.48 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.48 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.48 |
| ▸ | SOAT1 | P35610 | 1/20 | 0.48 |
| ▸ | THRB | P10828 | 1/20 | 0.48 |
| ▸ | FNTA | P49354 | 1/20 | 0.48 |
| ▸ | FNTB | P49356 | 1/20 | 0.48 |
| ▸ | PGGT1B | P53609 | 1/20 | 0.48 |
| ▸ | GPR84 | Q9NQS5 | 7/20 | 0.48 |
| ▸ | PPARG | P37231 | 6/20 | 0.48 |
| ▸ | PPARD | Q03181 | 6/20 | 0.48 |
| ▸ | PPARA | Q07869 | 6/20 | 0.48 |
| ▸ | HDAC11 | Q96DB2 | 5/20 | 0.48 |
| ▸ | TSHR | P16473 | 4/20 | 0.48 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4085870 | 1.00 | CES2 (0.50) | CES2CES1FAAHMEN1KMT2A | |
| SCHEMBL27988309 | 1.00 | CES2 (0.50) | CES2CES1FAAHMEN1KMT2A | |
| SCHEMBL27647689 | 1.00 | CES2 (0.50) | CES2CES1FAAHMEN1KMT2A | |
| SCHEMBL3467535 | 1.00 | CES2 (0.50) | CES2CES1FAAHMEN1KMT2A | |
| SCHEMBL3466717 | 1.00 | CES2 (0.50) | CES2CES1FAAHMEN1KMT2A | |
| SCHEMBL10592271 | 0.98 | CES2 (0.48) | CES2CES1FAAHMEN1KMT2A | |
| Dimethylamine SCHEMBL28693608 | 0.94 | CES2 (0.45) | CES2CES1FAAHMEN1KMT2A | |
| SCHEMBL2469796 | 0.91 | CES1 (0.46) | CES2CES1FAAHMEN1KMT2A | |
| SCHEMBL6829879 | 0.88 | DNM1 (0.49) | CES2CES1FAAHMEN1KMT2A | |
| SCHEMBL16913010 | 0.88 | DNM1 (0.49) | CES2CES1FAAHMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110462797-B | Polishing composition | 福吉米株式会社 | 2023-09-22 | — | — | CN | disclosed |
| CN-110998800-B | Polishing liquid, polishing liquid set and polishing method | 株式会社力森诺科 | 2023-09-22 | — | — | CN | disclosed |
| CN-106463386-B | Method for polishing silicon wafer, polishing composition, and polishing composition set | 福吉米株式会社 | 2020-12-01 | — | — | CN | disclosed |
| CN-111433311-A | Polishing liquid, polishing liquid set, polishing method, and defect suppression method | 日立化成株式会社 | 2020-07-17 | — | — | CN | disclosed |
| CN-111040731-A | Composition for polishing silicon wafer | 福吉米株式会社 | 2020-04-21 | — | — | CN | disclosed |
| CN-110998800-A | Polishing liquid, polishing liquid set and polishing method | 日立化成株式会社 | 2020-04-10 | — | — | CN | disclosed |
| CN-108713242-A | The grinding method and composition for polishing set group of silicon substrate | 福吉米株式会社 | 2018-10-26 | — | — | CN | disclosed |
| CN-104995277-B | Composition for polishing, composition for polishing manufacture method and abrasive material manufacture method | 福吉米株式会社 | 2018-05-08 | — | — | CN | disclosed |
| CN-105073941-B | Composition for polishing and abrasive material manufacture method | 福吉米株式会社 | 2018-01-30 | — | — | CN | disclosed |
| CN-106463386-A | Method for polishing silicon wafer, polishing composition, and polishing composition set | 福吉米株式会社 | 2017-02-22 | — | — | CN | disclosed |
| US-20120000780-A1 | Physically Crosslinked Copolymer Compounds and Related Compositions and Methods for Electrophoretic Separation | NORTHWESTERN UNIVERSITY (US) | 2012-01-05 | — | — | US | disclosed |
| US-8017682-B2 | Physically crosslinked copolymer compounds and related compositions and methods for electrophoretic separation | NORTHWESTERN UNIVERSITY (US) | 2011-09-13 | — | — | US | disclosed |
| WO-2010069514-A1 | RELATIVE PERMEABILITY MODIFIERS BASED ON HYDROPHOBICALLY MODIFIED CATIONIC COPOLYMERS | ENI S.P.A. (IT) | 2010-06-24 | — | — | WO | disclosed |
| EP-2024405-A4 | PHYSICALLY CROSSLINKED COPOLYMER COMPOUNDS AND RELATED COMPOSITIONS AND METHODS FOR ELECTROPHORETIC SEPARATION | UNIV NORTHWESTERN (US) | 2009-05-27 | — | — | EP | disclosed |
| US-7500895-B2 | Patterned substrate, electro-optical device, and method for manufacturing an electro-optical device | SEIKO EPSON CORPORATION (JP) | 2009-03-10 | — | — | US | disclosed |
| EP-2024405-A2 | PHYSICALLY CROSSLINKED COPOLYMER COMPOUNDS AND RELATED COMPOSITIONS AND METHODS FOR ELECTROPHORETIC SEPARATION | Northwestern University (US) | 2009-02-18 | — | — | EP | disclosed |
| WO-2008060329-A2 | PHYSICALLY CROSSLINKED COPOLYMER COMPOUNDS AND RELATED COMPOSITIONS AND METHODS FOR ELECTROPHORETIC SEPARATION | NORTHWESTERN UNIVERSITY (US) | 2008-05-22 | — | — | WO | disclosed |
| US-20070265395-A1 | Physically crosslinked copolymer compounds and related compositions and methods for electrophoretic separation | NATIONAL SCIENCE FOUNDATION | 2007-11-15 | — | — | US | disclosed |
| US-20060127563-A1 | Patterned substrate, electro-optical device, and method for manufacturing an electro-optical device | SEIKO EPSON CORPORATION (JP) | 2006-06-15 | — | — | US | disclosed |
| US-20050287392-A1 | Organic electroluminescent device, method for producing the same, and electronic apparatus | SEIKO EPSON CORPORATION (JP) | 2005-12-29 | — | — | US | disclosed |