Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES2 | O00748 | 3/20 | 0.50 |
| ▸ | CES1 | P23141 | 3/20 | 0.50 |
| ▸ | FAAH | O00519 | 3/20 | 0.48 |
| ▸ | MEN1 | O00255 | 2/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.48 |
| ▸ | TP53 | P04637 | 1/20 | 0.48 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.48 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.48 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.48 |
| ▸ | SOAT1 | P35610 | 1/20 | 0.48 |
| ▸ | THRB | P10828 | 1/20 | 0.48 |
| ▸ | FNTA | P49354 | 1/20 | 0.48 |
| ▸ | FNTB | P49356 | 1/20 | 0.48 |
| ▸ | PGGT1B | P53609 | 1/20 | 0.48 |
| ▸ | GPR84 | Q9NQS5 | 7/20 | 0.48 |
| ▸ | PPARG | P37231 | 6/20 | 0.48 |
| ▸ | PPARD | Q03181 | 6/20 | 0.48 |
| ▸ | PPARA | Q07869 | 6/20 | 0.48 |
| ▸ | HDAC11 | Q96DB2 | 5/20 | 0.48 |
| ▸ | TSHR | P16473 | 4/20 | 0.48 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4085870 | 1.00 | CES2 (0.50) | CES2CES1FAAHMEN1KMT2A | |
| SCHEMBL27988309 | 1.00 | CES2 (0.50) | CES2CES1FAAHMEN1KMT2A | |
| SCHEMBL27647689 | 1.00 | CES2 (0.50) | CES2CES1FAAHMEN1KMT2A | |
| SCHEMBL3466717 | 1.00 | CES2 (0.50) | CES2CES1FAAHMEN1KMT2A | |
| SCHEMBL250174 | 1.00 | CES2 (0.50) | CES2CES1FAAHMEN1KMT2A | |
| SCHEMBL10592271 | 0.98 | CES2 (0.48) | CES2CES1FAAHMEN1KMT2A | |
| Dimethylamine SCHEMBL28693608 | 0.94 | CES2 (0.45) | CES2CES1FAAHMEN1KMT2A | |
| SCHEMBL2469796 | 0.91 | CES1 (0.46) | CES2CES1FAAHMEN1KMT2A | |
| SCHEMBL6829879 | 0.88 | DNM1 (0.49) | CES2CES1FAAHMEN1KMT2A | |
| SCHEMBL16913010 | 0.88 | DNM1 (0.49) | CES2CES1FAAHMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3520772-B1 | COSMETIC RAW MATERIAL USING CORE-CORONA TYPE MICROPARTICLES AND OIL-IN-WATER TYPE EMULSION COSMETIC | SHISEIDO CO LTD (JP) | 2023-12-20 | — | — | EP | claimed |
| US-6331294-B1 | FOR HOMOGENEOUS PHARMACEUTICAL OR COSMETIC PREPARATIONS, | BASF AKTIENGESELLSCHAFT (DE) | 2001-12-18 | — | — | US | claimed |
| CN-113195570-A | Anionic graft polymerization on existing polymer chains by metal organic base activation | 埃克森美孚化学专利公司 | 2021-07-30 | — | — | CN | disclosed |
| CN-106463386-B | Method for polishing silicon wafer, polishing composition, and polishing composition set | 福吉米株式会社 | 2020-12-01 | — | — | CN | disclosed |
| CN-111433311-A | Polishing liquid, polishing liquid set, polishing method, and defect suppression method | 日立化成株式会社 | 2020-07-17 | — | — | CN | disclosed |
| CN-111040731-A | Composition for polishing silicon wafer | 福吉米株式会社 | 2020-04-21 | — | — | CN | disclosed |
| CN-110998800-A | Polishing liquid, polishing liquid set and polishing method | 日立化成株式会社 | 2020-04-10 | — | — | CN | disclosed |
| CN-110462797-A | Polishing composition | FUJIMI INC | 2019-11-15 | — | — | CN | disclosed |
| CN-106233424-B | Silicon Wafer composition for polishing | 福吉米株式会社 | 2018-12-25 | — | — | CN | disclosed |
| EP-2205097-A1 | SYSTEMICITY ENHANCERS | BASF SE (DE) | 2010-07-14 | — | — | EP | disclosed |
| WO-2010069514-A1 | RELATIVE PERMEABILITY MODIFIERS BASED ON HYDROPHOBICALLY MODIFIED CATIONIC COPOLYMERS | ENI S.P.A. (IT) | 2010-06-24 | — | — | WO | disclosed |
| WO-2009040248-A1 | SYSTEMICITY ENHANCERS | BASF SE (DE) | 2009-04-02 | — | — | WO | disclosed |
| US-7500895-B2 | Patterned substrate, electro-optical device, and method for manufacturing an electro-optical device | SEIKO EPSON CORPORATION (JP) | 2009-03-10 | — | — | US | disclosed |
| EP-1915407-A2 | N-VINYLCAPROLACTAM-BASED COPOLYMERS AND THE USE THEREOF AS SOLUBILIZERS | BASF SE (DE) | 2008-04-30 | — | — | EP | disclosed |
| WO-2007017452-A2 | N-VINYLCAPROLACTAM-BASED COPOLYMERS AND THE USE THEREOF AS SOLUBILIZERS | BASF SE (DE) | 2007-02-15 | — | — | WO | disclosed |
| US-20060127563-A1 | Patterned substrate, electro-optical device, and method for manufacturing an electro-optical device | SEIKO EPSON CORPORATION (JP) | 2006-06-15 | — | — | US | disclosed |
| US-20050287392-A1 | Organic electroluminescent device, method for producing the same, and electronic apparatus | SEIKO EPSON CORPORATION (JP) | 2005-12-29 | — | — | US | disclosed |
| WO-1998020084-A1 | ALKALINE INK AND COATED SUBSTRATE SUITABLE FOR USE WITH INK JET PRINTERS | BLAZER TECHNOLOGIES PTY. LTD. (AU) | 1998-05-14 | — | — | WO | disclosed |
| US-4020192-A | AMINO ALKYL AMIDE ACRYLIC POLYMER | FUJI XEROX CO., LTD. (JA) | 1977-04-26 | — | — | US | disclosed |