⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2476553 | 0.74 | CYP2D6 (0.33) | — | |
| SCHEMBL2476473 | 0.68 | HSD11B1 (0.36) | — | |
| SCHEMBL1151137 | 0.67 | — | — | |
| SCHEMBL1349275 | 0.66 | HSD11B1 (0.30) | — | |
| SCHEMBL4404945 | 0.64 | CYP2D6 (0.32) | — | |
| SCHEMBL6758974 | 0.64 | HSD11B1 (0.32) | — | |
| SCHEMBL6864996 | 0.64 | — | — | |
| SCHEMBL2477129 | 0.63 | HSD11B1 (0.33) | — | |
| SCHEMBL7201984 | 0.63 | HSD11B1 (0.31) | — | |
| SCHEMBL5675381 | 0.61 | ALDH1A1 (0.39) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1078945-B1 | Polymer for use in a photoresist composition | SAMSUNG ELECTRONICS CO LTD (KR) | 2011-10-12 | — | — | EP | disclosed |
| US-6642336-B1 | Ultraviolet radiation transparent; improved adhesion, contrast and dry etch resistance | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2003-11-04 | — | — | US | disclosed |
| EP-1078945-A2 | Polymer for use in a photoresist composition | SAMSUNG ELECTRONICS CO. LTD. (KR) | 2001-02-28 | — | — | EP | disclosed |