Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 2/20 | 0.43 |
| ▸ | CA2 | P00918 | 2/20 | 0.43 |
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
| ▸ | APP | P05067 | 7/20 | 0.35 |
| ▸ | RXRA | P19793 | 1/20 | 0.35 |
| ▸ | RXRB | P28702 | 1/20 | 0.35 |
| ▸ | MEN1 | O00255 | 2/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.34 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | MMP2 | P08253 | 1/20 | 0.32 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | NPC1 | O15118 | 1/20 | 0.32 |
| ▸ | RAB9A | P51151 | 1/20 | 0.32 |
| ▸ | TOP2A | P11388 | 1/20 | 0.31 |
| ▸ | TOP2B | Q02880 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24810199 | 0.71 | HSD17B10 (0.38) | MAPTMEN1KMT2AHSD17B10HPGD | |
| SCHEMBL24811311 | 0.71 | ALDH1A1 (0.39) | CA1CA2MAPTHSD17B10HPGD | |
| SCHEMBL940862 | 0.71 | ALDH1A1 (0.46) | CA1CA2MAPTMEN1KMT2A | |
| SCHEMBL24811764 | 0.70 | L3MBTL1 (0.41) | — | |
| SCHEMBL21153835 | 0.70 | SMN1; SMN2 (0.38) | MAPTHSD17B10HPGDHTTNPC1 | |
| SCHEMBL24809991 | 0.69 | HPGD (0.34) | MAPTMEN1KMT2AHSD17B10HPGD | |
| SCHEMBL31047142 | 0.68 | APP (0.71) | APPRXRARXRBNPC1RAB9A | |
| SCHEMBL15189382 | 0.68 | TDP1 (0.46) | CA1CA2MAPTMEN1KMT2A | |
| SCHEMBL24810200 | 0.68 | HPGD (0.34) | MAPTMEN1KMT2AHSD17B10HPGD | |
| SCHEMBL17752220 | 0.68 | ALDH1A1 (0.42) | CA1CA2MAPTMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20220413385-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST PATTERN | JSR CORPORATION (JP) | 2022-12-29 | — | — | US | disclosed |