SCHEMBL24811764

SCHEMBL24811764

C=Cc1ccc(Oc2c(F)c(F)c(C(=O)OCC3COC(=O)O3)c(F)c2F)cc1

nearest known ligand 0.41

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
▸ L3MBTL1 Q9Y468 2/20 0.41
▸ MAPK1 P28482 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24811758 0.72 ALDH1A1 (0.41) MAPK1
SCHEMBL24811309 0.70 CA1 (0.43) —
SCHEMBL20504358 0.69 L3MBTL1 (0.46) L3MBTL1MAPK1
SCHEMBL24810199 0.67 HSD17B10 (0.38) L3MBTL1
SCHEMBL1301565 0.67 L3MBTL1 (0.37) L3MBTL1MAPK1
SCHEMBL26206428 0.67 L3MBTL1 (0.38) L3MBTL1MAPK1
SCHEMBL16683966 0.67 L3MBTL1 (0.60) L3MBTL1MAPK1
SCHEMBL21425543 0.67 L3MBTL1 (0.44) L3MBTL1MAPK1
Bicarbonate SCHEMBL27236960 0.67 L3MBTL1 (0.44) L3MBTL1MAPK1
SCHEMBL940862 0.66 ALDH1A1 (0.46) L3MBTL1MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220413385-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST PATTERN JSR CORPORATION (JP) 2022-12-29 — — US disclosed
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