SCHEMBL2481141

SCHEMBL2481141

CC(C)(COC(=O)C1CC2C=CC1C2)C1(O)OC1=O

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 10/20 0.43
POLB P06746 3/20 0.42
HSD17B10 Q99714 2/20 0.42
APEX1 P27695 1/20 0.42
RECQL P46063 1/20 0.42
BLM P54132 1/20 0.42
ESR2 Q92731 1/20 0.42
TDP1 Q9NUW8 1/20 0.42
L3MBTL1 Q9Y468 1/20 0.42
HPGD P15428 1/20 0.42
KMT2A Q03164 3/20 0.41
RAB9A P51151 1/20 0.41
KDM4E B2RXH2 2/20 0.36
MAPK1 P28482 2/20 0.36
LMNA P02545 2/20 0.36
MEN1 O00255 1/20 0.35
ALOX15 P16050 1/20 0.35
TSHR P16473 1/20 0.35
HTT P42858 1/20 0.35
MAPT P10636 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23228322 0.80 ALDH1A1 (0.46) ALDH1A1POLBHSD17B10APEX1RECQL
SCHEMBL12228740 0.80 ALDH1A1 (0.46) ALDH1A1POLBHSD17B10APEX1RECQL
SCHEMBL14449005 0.80 ALDH1A1 (0.46) ALDH1A1POLBHSD17B10APEX1RECQL
SCHEMBL14449932 0.80 ALDH1A1 (0.46) ALDH1A1POLBHSD17B10APEX1RECQL
SCHEMBL4400475 0.80 ALDH1A1 (0.46) ALDH1A1POLBHSD17B10APEX1RECQL
SCHEMBL5872995 0.78 ALDH1A1 (0.45) ALDH1A1POLBHSD17B10APEX1RECQL
SCHEMBL14435506 0.76 LMNA (0.47) ALDH1A1POLBHSD17B10APEX1RECQL
SCHEMBL899899 0.76 LMNA (0.47) ALDH1A1POLBHSD17B10APEX1RECQL
SCHEMBL24255192 0.75 ALDH1A1 (0.43) ALDH1A1POLBHSD17B10APEX1RECQL
SCHEMBL200507 0.75 ALDH1A1 (0.49) ALDH1A1POLBHSD17B10APEX1RECQL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1078945-B1 Polymer for use in a photoresist composition SAMSUNG ELECTRONICS CO LTD (KR) 2011-10-12 EP disclosed
US-6642336-B1 Ultraviolet radiation transparent; improved adhesion, contrast and dry etch resistance SAMSUNG ELECTRONICS CO., LTD. (KR) 2003-11-04 US disclosed
EP-1078945-A2 Polymer for use in a photoresist composition SAMSUNG ELECTRONICS CO. LTD. (KR) 2001-02-28 EP disclosed