SCHEMBL26206428

SCHEMBL26206428

O=C1OCC(COC(=O)c2cc(I)ccc2Oc2c(F)c(F)c(S(=O)(=O)O)c(F)c2F)O1

nearest known ligand 0.38

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
▸ L3MBTL1 Q9Y468 2/20 0.38
▸ MAPK1 P28482 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26206441 0.73 — —
SCHEMBL26208675 0.71 TSHR (0.38) L3MBTL1MAPK1
SCHEMBL26206436 0.69 S1PR3 (0.30) —
SCHEMBL16683966 0.68 L3MBTL1 (0.60) L3MBTL1MAPK1
SCHEMBL24811764 0.67 L3MBTL1 (0.41) L3MBTL1MAPK1
SCHEMBL1301565 0.66 L3MBTL1 (0.37) L3MBTL1MAPK1
SCHEMBL26206593 0.66 CA1 (0.34) —
SCHEMBL20504358 0.65 L3MBTL1 (0.46) L3MBTL1MAPK1
SCHEMBL14003897 0.65 L3MBTL1 (0.43) L3MBTL1MAPK1
SCHEMBL19769965 0.64 L3MBTL1 (0.58) L3MBTL1MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023162565-A1 ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD 富士フイルム株式会社 2023-08-31 — — WO disclosed
Send feedback