SCHEMBL24901028

SCHEMBL24901028

O=C(OC(C(F)(F)F)C(F)(F)F)C(O)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.34

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
ABHD6 Q9BV23 9/20 0.34
CA1 P00915 1/20 0.30
CA2 P00918 1/20 0.30
CA9 Q16790 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5314963 0.78 ABHD6 (0.32) ABHD6CA1CA2CA9
SCHEMBL24142277 0.77 GABRA1 (0.32)
SCHEMBL5312660 0.77 ABHD6 (0.33) ABHD6CA1CA2CA9
SCHEMBL24177696 0.76 MEN1 (0.40) CA1CA2CA9
SCHEMBL10543184 0.74 ABHD6 (0.35) ABHD6
SCHEMBL5332304 0.74 THRB (0.34) ABHD6
SCHEMBL15999600 0.74
SCHEMBL4378631 0.73 PRKCA (0.41) ABHD6CA1CA2CA9
SCHEMBL22062183 0.73 ABHD6 (0.35) ABHD6CA1CA2CA9
SCHEMBL15824292 0.71 CA1 (0.36) ABHD6CA1CA2CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230023593-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed
US-20230019681-A1 POSITIVE RESIST MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR ABHD6 1660/4885CA1 1910/4885CA2 472/4885
US-20230023593-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS HNRNPU, EWSR1, HNRNPR ABHD6 2322/4885CA1 1590/4885CA2 849/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.