Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.44 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.44 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.44 |
| ▸ | CES2 | O00748 | 2/20 | 0.39 |
| ▸ | CES1 | P23141 | 2/20 | 0.39 |
| ▸ | POLB | P06746 | 1/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.39 |
| ▸ | FAAH | O00519 | 2/20 | 0.38 |
| ▸ | EPAS1 | Q99814 | 1/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.37 |
| ▸ | MAPT | P10636 | 1/20 | 0.37 |
| ▸ | HPGD | P15428 | 1/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.37 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.36 |
| ▸ | HSPB1 | P04792 | 2/20 | 0.36 |
| ▸ | AR | P10275 | 1/20 | 0.35 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.35 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10179830 | 0.85 | TSHR (0.45) | TSHRL3MBTL1KDM4ENPSR1TDP1 | |
| SCHEMBL10179777 | 0.84 | TSHR (0.47) | TSHRL3MBTL1KDM4ENPSR1TDP1 | |
| SCHEMBL24946068 | 0.83 | FAAH (0.41) | L3MBTL1CES2CES1FAAHMAPT | |
| SCHEMBL20368797 | 0.79 | ELANE (0.50) | TSHRL3MBTL1KDM4ENPSR1TDP1 | |
| SCHEMBL24901031 | 0.78 | CES2 (0.37) | NPSR1CES2CES1POLBEPHX2 | |
| SCHEMBL24901029 | 0.77 | CES2 (0.34) | CES2CES1KMT2A | |
| SCHEMBL24901188 | 0.77 | CES2 (0.39) | CES2CES1HPGDKMT2A | |
| SCHEMBL2914318 | 0.76 | CES2 (0.48) | TSHRL3MBTL1KDM4ENPSR1TDP1 | |
| SCHEMBL10658758 | 0.76 | CES2 (0.48) | TSHRL3MBTL1KDM4ENPSR1TDP1 | |
| SCHEMBL29462972 | 0.76 | CES2 (0.48) | TSHRL3MBTL1KDM4ENPSR1TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230023593-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-01-26 | — | — | US | disclosed |
| US-20230019681-A1 | POSITIVE RESIST MATERIAL AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-01-19 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230023593-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | HNRNPU, EWSR1, HNRNPR | TSHR 2477/4885L3MBTL1 2700/4885KDM4E 4103/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.