SCHEMBL24901029

SCHEMBL24901029

O=C(Oc1c(F)cc(F)cc1F)C(O)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.34

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
CES2 O00748 3/20 0.34
CES1 P23141 3/20 0.34
ERN1 O75460 1/20 0.32
GAA P10253 1/20 0.30
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10180361 0.83 CES2 (0.35) CES2CES1ERN1GAAKMT2A
SCHEMBL10181554 0.82 CES2 (0.38) CES2CES1ERN1GAAKMT2A
SCHEMBL24901181 0.77 TSHR (0.44) CES2CES1KMT2A
SCHEMBL24901074 0.76 TSHR (0.32)
SCHEMBL24901030 0.74 CES2 (0.38) CES2CES1
SCHEMBL26770744 0.74 CES2 (0.40) CES2CES1ERN1GAAKMT2A
SCHEMBL5272075 0.73 CES2 (0.43) CES2CES1ERN1GAAKMT2A
SCHEMBL376597 0.73 ERN1 (0.45) CES2CES1ERN1GAAKMT2A
SCHEMBL18697364 0.73 CES2 (0.43) CES2CES1ERN1GAAKMT2A
SCHEMBL24901040 0.73 POLB (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230023593-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed
US-20230019681-A1 POSITIVE RESIST MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230023593-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS HNRNPU, EWSR1, HNRNPR CES2 1660/4885CES1 3887/4885ERN1 890/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.