Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES2 | O00748 | 2/20 | 0.37 |
| ▸ | CES1 | P23141 | 2/20 | 0.37 |
| ▸ | SCN8A | Q9UQD0 | 1/20 | 0.32 |
| ▸ | SCN10A | Q9Y5Y9 | 1/20 | 0.32 |
| ▸ | CYP4F2 | P78329 | 1/20 | 0.32 |
| ▸ | CYP4A11 | Q02928 | 1/20 | 0.32 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.31 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24901188 | 0.85 | CES2 (0.39) | CES2CES1 | |
| SCHEMBL10179556 | 0.84 | CES2 (0.38) | CES2CES1SCN8ASCN10AEPHX2 | |
| SCHEMBL10180776 | 0.84 | CES2 (0.41) | CES2CES1SCN8ASCN10ACYP4F2 | |
| SCHEMBL24901032 | 0.83 | CES2 (0.31) | CES2CES1 | |
| SCHEMBL24901181 | 0.78 | TSHR (0.44) | CES2CES1POLBNPSR1EPHX2 | |
| SCHEMBL24946068 | 0.77 | FAAH (0.41) | CES2CES1 | |
| SCHEMBL3827377 | 0.74 | CES2 (0.45) | CES2CES1SCN8ASCN10ACYP4F2 | |
| SCHEMBL17552759 | 0.73 | RIPK1 (0.48) | CES2CES1CYP4F2CYP4A11 | |
| SCHEMBL12636052 | 0.73 | CES2 (0.41) | CES2CES1CYP4F2CYP4A11 | |
| SCHEMBL24901099 | 0.72 | CES2 (0.37) | CES2CES1CYP4F2CYP4A11POLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230023593-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-01-26 | — | — | US | disclosed |
| US-20230019681-A1 | POSITIVE RESIST MATERIAL AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-01-19 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230023593-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | HNRNPU, EWSR1, HNRNPR | CES2 1660/4885CES1 3887/4885SCN8A 2556/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.