SCHEMBL24901411

SCHEMBL24901411

OC(c1ccccc1F)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 3/20 0.46
KMT2A Q03164 3/20 0.46
KDM4E B2RXH2 2/20 0.46
MAPT P10636 2/20 0.46
SMN1; SMN2 Q16637 2/20 0.46
MAPK1 P28482 2/20 0.46
LMNA P02545 1/20 0.46
HTT P42858 1/20 0.46
NPSR1 Q6W5P4 1/20 0.46
HSD17B10 Q99714 2/20 0.44
ALDH1A1 P00352 1/20 0.44
GLA P06280 1/20 0.44
POLB P06746 1/20 0.44
GAA P10253 1/20 0.44
HPGD P15428 1/20 0.44
ATM Q13315 1/20 0.44
KCNN4 O15554 5/20 0.41
NR1H2 P55055 3/20 0.38
NR1H3 Q13133 3/20 0.38
PDK1 Q15118 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2582219 0.85 MEN1 (0.52) MEN1KMT2AKDM4EMAPTSMN1; SMN2
SCHEMBL24901415 0.82 MEN1 (0.39) MEN1KMT2AKDM4EMAPTSMN1; SMN2
SCHEMBL7777113 0.80 KCNN4 (0.44) ALDH1A1KCNN4PDK1PDK2PDK3
SCHEMBL6489440 0.78 KCNN4 (0.42) ALDH1A1KCNN4PDK1PDK2PDK3
SCHEMBL27309764 0.77 KCNN4 (0.39) MEN1KMT2AKDM4EMAPTSMN1; SMN2
SCHEMBL5331319 0.76 KCNN4 (0.41) ALDH1A1KCNN4PDK1PDK2PDK3
SCHEMBL1873962 0.76 ALDH1A1 (0.50) MEN1KMT2AKDM4EMAPTSMN1; SMN2
SCHEMBL7206142 0.76 PDK1 (0.42) ALDH1A1KCNN4PDK1PDK2PDK3
SCHEMBL7937247 0.75 KCNN4 (0.39) ALDH1A1POLBKCNN4PDK1PDK2
SCHEMBL2974843 0.75 KCNN4 (0.44) LMNAALDH1A1GAAKCNN4PDK2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230023593-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed
US-20230019681-A1 POSITIVE RESIST MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230023593-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS HNRNPU, EWSR1, HNRNPR MEN1 4466/4885KMT2A 3819/4885KDM4E 4103/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.