SCHEMBL24901415

SCHEMBL24901415

OC(c1cccc(F)c1F)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 3/20 0.39
KMT2A Q03164 3/20 0.39
KDM4E B2RXH2 2/20 0.39
MAPT P10636 2/20 0.39
SMN1; SMN2 Q16637 2/20 0.39
MAPK1 P28482 2/20 0.39
LMNA P02545 1/20 0.39
HTT P42858 1/20 0.39
NPSR1 Q6W5P4 1/20 0.39
CES2 O00748 2/20 0.39
CES1 P23141 2/20 0.39
BCHE P06276 1/20 0.39
HSD17B10 Q99714 2/20 0.38
ALDH1A1 P00352 1/20 0.38
GLA P06280 1/20 0.38
POLB P06746 1/20 0.38
GAA P10253 1/20 0.38
HPGD P15428 1/20 0.38
ATM Q13315 1/20 0.38
HSD11B1 P28845 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24901411 0.82 MEN1 (0.46) MEN1KMT2AKDM4EMAPTSMN1; SMN2
SCHEMBL1201504 0.82 CES2 (0.41) CES2CES1BCHEHPGDHSD11B1
SCHEMBL24901421 0.80 MEN1 (0.39) MEN1KMT2AKDM4EMAPTSMN1; SMN2
SCHEMBL2965656 0.77 CES2 (0.41) CES2CES1BCHEHPGDHSD11B1
SCHEMBL29551965 0.77 HSD11B1 (0.47) CES2CES1BCHEALDH1A1POLB
SCHEMBL448487 0.77 HSD11B1 (0.47) CES2CES1BCHEALDH1A1POLB
SCHEMBL2582219 0.76 MEN1 (0.52) MEN1KMT2AKDM4EMAPTSMN1; SMN2
SCHEMBL19135684 0.76 CES2 (0.40) CES2CES1BCHEHPGDHSD11B1
SCHEMBL19225364 0.76 CES2 (0.40) CES2CES1BCHEHPGDHSD11B1
SCHEMBL29261708 0.75 CES2 (0.36) CES2CES1BCHEHSD11B1PDK2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230023593-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed
US-20230019681-A1 POSITIVE RESIST MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230023593-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS HNRNPU, EWSR1, HNRNPR MEN1 4466/4885KMT2A 3819/4885KDM4E 4103/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.