SCHEMBL24908466

SCHEMBL24908466

CC(C)(C)C(=O)OC(C)(C)c1ccc(F)cc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 3/20 0.43
SMN1; SMN2 Q16637 3/20 0.43
NPC1 O15118 2/20 0.43
RAB9A P51151 2/20 0.43
MEN1 O00255 2/20 0.43
MAPT P10636 2/20 0.43
XBP1 P17861 1/20 0.43
MAPK1 P28482 1/20 0.43
HTT P42858 1/20 0.43
KCNN4 O15554 3/20 0.42
L3MBTL1 Q9Y468 2/20 0.38
CASP3 P42574 1/20 0.38
SENP8 Q96LD8 1/20 0.38
SENP7 Q9BQF6 1/20 0.38
SENP6 Q9GZR1 1/20 0.38
ELANE P08246 5/20 0.38
HSD11B1 P28845 1/20 0.38
LMNA P02545 3/20 0.37
ALDH1A1 P00352 1/20 0.37
ALOX12 P18054 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25541804 0.85 CES2 (0.45) MAPTHTTL3MBTL1ELANELMNA
SCHEMBL1790671 0.84 SMN1; SMN2 (0.46) KMT2ASMN1; SMN2NPC1RAB9AMEN1
SCHEMBL25563980 0.82 SMN1; SMN2 (0.44) KMT2ASMN1; SMN2NPC1RAB9AMEN1
SCHEMBL1790672 0.82 SMN1; SMN2 (0.44) KMT2ASMN1; SMN2NPC1RAB9AMEN1
SCHEMBL14827401 0.82 RIPK1 (0.45) KMT2ASMN1; SMN2NPC1RAB9AMEN1
SCHEMBL24142485 0.82 HSD11B1 (0.44) KMT2ASMN1; SMN2NPC1RAB9AMEN1
SCHEMBL20306573 0.80 KDM4E (0.41) KMT2ASMN1; SMN2NPC1RAB9AMEN1
SCHEMBL22168543 0.80 ALDH1A1 (0.54) KMT2AMAPTMAPK1KCNN4ELANE
SCHEMBL25634723 0.80 KDM4E (0.38) KMT2ASMN1; SMN2NPC1RAB9AMEN1
SCHEMBL25140031 0.79 KCNN4 (0.49) NPC1RAB9AHTTKCNN4CES2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11914294-B2 Positive resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-02-27 US disclosed
US-20230251572-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-10 US disclosed
US-20230161255-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-20230013624-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-19 US disclosed