Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.31 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7102626 | 0.92 | TSHR (0.33) | KDM4ETSHRTDP1CYP1A2CYP2C19 | |
| SCHEMBL476526 | 0.90 | TSHR (0.36) | KDM4ETSHRTDP1CYP1A2CYP2C19 | |
| SCHEMBL476544 | 0.90 | TSHR (0.36) | KDM4ETSHRTDP1CYP1A2CYP2C19 | |
| SCHEMBL717488 | 0.90 | TSHR (0.36) | KDM4ETSHRTDP1CYP1A2CYP2C19 | |
| SCHEMBL476596 | 0.90 | TSHR (0.36) | KDM4ETSHRTDP1CYP1A2CYP2C19 | |
| SCHEMBL61019 | 0.82 | — | — | |
| SCHEMBL15404541 | 0.79 | — | — | |
| SCHEMBL15404998 | 0.79 | — | — | |
| SCHEMBL3034719 | 0.79 | KDM4E (0.31) | KDM4ETSHRTDP1 | |
| SCHEMBL15402521 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240231231-A1 | METHOD FOR FORMING RESIST UNDERLAYER FILM, METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE, COMPOSITION, AND RESIST UNDERLAYER FILM | JSR CORPORATION (JP) | 2024-07-11 | — | — | US | disclosed |
| US-20240184203-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, AND METHOD FOR FORMING RESIST UNDERLAYER FILM | JSR CORPORATION (JP) | 2024-06-06 | — | — | US | disclosed |
| CN-117642698-A | Composition for forming resist underlayer film, method for producing semiconductor substrate, and method for forming resist underlayer film | JSR株式会社 | 2024-03-01 | — | — | CN | disclosed |
| US-20230041656-A1 | COMPOSITION, METHOD OF FORMING RESIST UNDERLAYER FILM, AND METHOD OF FORMING RESIST PATTERN | JSR CORPORATION (JP) | 2023-02-09 | — | — | US | disclosed |
| WO-2023008149-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, AND METHOD FOR FORMING RESIST UNDERLAYER FILM | JSR株式会社 | 2023-02-02 | — | — | WO | disclosed |
| EP-1589367-B1 | PHOTOCHROMIC CONTACT LENS EXCELLING IN DECOLORING CHARACTERISTIC | MENICON CO LTD (JP) | 2019-03-13 | — | — | EP | disclosed |
| US-8901170-B2 | Malononitrile compounds | BASF SE (DE) | 2014-12-02 | — | — | US | disclosed |
| CN-103666006-A | Surfactant, coating composite and resist composition | DAINIPPON INK & CHEMICALS | 2014-03-26 | — | — | CN | disclosed |
| CN-101506150-B | Malononitrile compounds | BASF SE | 2013-08-28 | — | — | CN | disclosed |
| EP-1697311-B1 | NITRILE COMPOUND AND ITS USE IN PEST CONTROL | SUMITOMO CHEMICAL CO (JP) | 2011-10-26 | — | — | EP | disclosed |
| WO-2007147888-A1 | MALONONITRILE COMPOUNDS | BASF SE (DE) | 2007-12-27 | — | — | WO | disclosed |
| US-20070112068-A1 | Nitrile compound and its use in pest control | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-05-17 | — | — | US | disclosed |
| EP-1566684-B1 | LENS FOR EYE AND METHOD FOR MARKING THEREOF | MENICON CO LTD (JP) | 2007-03-14 | — | — | EP | disclosed |
| CN-1898200-A | Nitrile compound and its pest control use | SUMITOMO CHEMICAL CO (JP) | 2007-01-17 | — | — | CN | disclosed |
| EP-1697311-A1 | NITRILE COMPOUND AND ITS USE IN PEST CONTROL | Sumitomo Chemical Company, Limited (JP) | 2006-09-06 | — | — | EP | disclosed |
| US-7044598-B2 | Lens for eye and method for marking thereof | MENICON CO., LTD.. (JP) | 2006-05-16 | — | — | US | disclosed |
| EP-1589367-A1 | PHOTOCHROMIC CONTACT LENS EXCELLING IN DECOLORING CHARACTERISTIC | MENICON CO., LTD. (JP) | 2005-10-26 | — | — | EP | disclosed |
| US-20050206843-A1 | Lens for eye and method for marking thereof | MENICON CO., LTD. (JP) | 2005-09-22 | — | — | US | disclosed |
| EP-1566684-A1 | LENS FOR EYE AND METHOD FOR MARKING THEREOF | MENICON CO., LTD. (JP) | 2005-08-24 | — | — | EP | disclosed |
| WO-2005063694-A1 | NITRILE COMPOUND AND ITS USE IN PEST CONTROL | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2005-07-14 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20070112068-A1 | Nitrile compound and its use in pest control | C5, C9, C1S | KDM4E 863/4885TSHR 1172/4885TDP1 4114/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.