SCHEMBL24944276

SCHEMBL24944276

Cc1ccc(S(=O)(=O)CC(=O)OC2(c3ccccc3)CCNCC2)cc1

nearest known ligand 0.47

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
RECQL P46063 1/20 0.47
HSD11B1 P28845 2/20 0.44
OPRM1 P35372 2/20 0.43
KMT2A Q03164 4/20 0.43
MEN1 O00255 2/20 0.43
CYP2C19 P33261 1/20 0.43
ALDH1A1 P00352 4/20 0.42
LMNA P02545 1/20 0.41
TP53 P04637 1/20 0.39
TDP1 Q9NUW8 1/20 0.39
HSD17B10 Q99714 1/20 0.39
MAPT P10636 1/20 0.38
CA12 O43570 1/20 0.38
CA9 Q16790 1/20 0.38
GAA P10253 1/20 0.38
OPRD1 P41143 1/20 0.37
OPRK1 P41145 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26413731 0.81 OPRM1 (0.47) OPRM1KMT2ALMNATDP1OPRD1
SCHEMBL24944045 0.79 OPRM1 (0.45) OPRM1KMT2AMEN1ALDH1A1LMNA
SCHEMBL24944653 0.79 OPRM1 (0.45) OPRM1KMT2AMEN1CYP2C19ALDH1A1
SCHEMBL24943996 0.78 DRD3 (0.48) OPRM1KMT2AMEN1ALDH1A1TDP1
SCHEMBL26478532 0.77 OPRM1 (0.47) OPRM1OPRD1OPRK1
SCHEMBL24944629 0.77 OPRM1 (0.58) OPRM1LMNAOPRD1OPRK1
SCHEMBL26413846 0.77 TDP1 (0.45) OPRM1ALDH1A1TDP1MAPTOPRD1
SCHEMBL24944678 0.77 OPRM1 (0.41) OPRM1LMNAOPRD1OPRK1
SCHEMBL24944860 0.76 OPRM1 (0.47) OPRM1KMT2AMEN1CYP2C19TDP1
SCHEMBL7751891 0.76 OPRM1 (0.41) OPRM1KMT2AMEN1CYP2C19ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR RECQL 3103/4885HSD11B1 3766/4885OPRM1 775/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.