SCHEMBL24944653

SCHEMBL24944653

Cc1ccc(OCC(=O)OC2(c3ccccc3)CCNCC2)cc1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 4/20 0.45
L3MBTL1 Q9Y468 3/20 0.44
GAA P10253 2/20 0.43
LMNA P02545 2/20 0.43
NPC1 O15118 4/20 0.41
TDP1 Q9NUW8 1/20 0.41
ALDH1A1 P00352 2/20 0.41
MEN1 O00255 1/20 0.41
KMT2A Q03164 1/20 0.41
TRPM8 Q7Z2W7 1/20 0.40
RAB9A P51151 3/20 0.40
SMN1; SMN2 Q16637 3/20 0.40
KDM4E B2RXH2 1/20 0.40
MAPT P10636 4/20 0.40
CYP2C19 P33261 2/20 0.39
CYP1A2 P05177 1/20 0.39
CYP3A4 P08684 1/20 0.39
CYP2C9 P11712 1/20 0.39
OPRD1 P41143 3/20 0.39
OPRK1 P41145 3/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944608 0.91 OPRM1 (0.44) OPRM1L3MBTL1GAAALDH1A1MEN1
SCHEMBL24944278 0.88 MAPT (0.47) OPRM1L3MBTL1GAALMNAALDH1A1
SCHEMBL26478741 0.88 GPR183 (0.44) OPRM1L3MBTL1GAALMNANPC1
SCHEMBL24944847 0.88 KMT2A (0.44) OPRM1L3MBTL1ALDH1A1MEN1KMT2A
SCHEMBL24944712 0.84 PTPN7 (0.51) GAANPC1TDP1ALDH1A1MEN1
SCHEMBL26413607 0.84 ALDH1A1 (0.47) LMNANPC1TDP1ALDH1A1KMT2A
SCHEMBL24944888 0.83 OPRM1 (0.45) OPRM1L3MBTL1ALDH1A1KMT2ASMN1; SMN2
SCHEMBL26413731 0.82 OPRM1 (0.47) OPRM1L3MBTL1LMNATDP1KMT2A
SCHEMBL24944596 0.82 OPRM1 (0.48) OPRM1ALDH1A1CYP1A2OPRD1OPRK1
SCHEMBL24944045 0.81 OPRM1 (0.45) OPRM1L3MBTL1GAALMNATDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR OPRM1 775/4885L3MBTL1 2012/4885GAA 4531/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.