SCHEMBL24944293

SCHEMBL24944293

COc1cc2ccccc2cc1C(=O)OC1(c2ccccc2)CCNCC1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.51
HPGD P15428 3/20 0.51
KDM4E B2RXH2 3/20 0.51
GLA P06280 1/20 0.42
GAA P10253 1/20 0.42
MAPK1 P28482 1/20 0.42
HSD17B10 Q99714 1/20 0.42
DRD2 P14416 2/20 0.41
DRD4 P21917 2/20 0.41
RAB9A P51151 2/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
KMT2A Q03164 4/20 0.41
MEN1 O00255 3/20 0.41
NPC1 O15118 3/20 0.41
POLB P06746 5/20 0.40
LMNA P02545 1/20 0.40
MAPT P10636 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
AHR P35869 1/20 0.40
CASP3 P42574 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944281 0.90 KMT2A (0.43) ALDH1A1HPGDKDM4EMAPK1HSD17B10
SCHEMBL24943724 0.87 CYP3A4 (0.46) ALDH1A1KDM4ERAB9AKMT2AMEN1
SCHEMBL24943720 0.87 KMT2A (0.50) ALDH1A1HPGDRAB9AL3MBTL1KMT2A
SCHEMBL26478785 0.86 OPRM1 (0.40) ALDH1A1HPGDKDM4EKMT2AMEN1
SCHEMBL26413478 0.85 SIGMAR1 (0.46) ALDH1A1HPGDDRD2RAB9AL3MBTL1
SCHEMBL24944936 0.84 SMN1; SMN2 (0.40) ALDH1A1HPGDKDM4EGAAMAPK1
SCHEMBL26413496 0.84 TSHR (0.44) ALDH1A1HPGDKDM4EMAPK1RAB9A
SCHEMBL26478780 0.84 POLB (0.42) ALDH1A1KDM4EHSD17B10DRD2DRD4
SCHEMBL26413500 0.84 AVPR2 (0.39) ALDH1A1HPGDMAPK1KMT2AMEN1
SCHEMBL24944652 0.83 SIGMAR1 (0.42) ALDH1A1L3MBTL1KMT2AMEN1SIGMAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR ALDH1A1 4767/4885HPGD 4346/4885KDM4E 1069/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.