SCHEMBL24944281

SCHEMBL24944281

COc1cc(OC)c(C(=O)OC2(c3ccccc3)CCNCC2)cc1OC

nearest known ligand 0.43

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 6/20 0.43
SIGMAR1 Q99720 1/20 0.41
OPRM1 P35372 2/20 0.40
PKM P14618 1/20 0.40
ALDH1A1 P00352 4/20 0.38
KDM4E B2RXH2 3/20 0.38
LMNA P02545 1/20 0.38
MAPT P10636 1/20 0.38
HTT P42858 1/20 0.38
MEN1 O00255 5/20 0.38
HPGD P15428 1/20 0.38
HSD17B10 Q99714 2/20 0.37
NPSR1 Q6W5P4 1/20 0.37
MAPK1 P28482 1/20 0.37
CYP3A4 P08684 1/20 0.37
NPC1 O15118 1/20 0.36
RAB9A P51151 1/20 0.36
TACR1 P25103 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26478785 0.91 OPRM1 (0.40) KMT2ASIGMAR1OPRM1ALDH1A1KDM4E
SCHEMBL24944293 0.90 ALDH1A1 (0.51) KMT2ASIGMAR1ALDH1A1KDM4ELMNA
SCHEMBL26478949 0.89 LCK (0.46) KMT2ASIGMAR1OPRM1ALDH1A1KDM4E
SCHEMBL26413478 0.87 SIGMAR1 (0.46) KMT2ASIGMAR1OPRM1ALDH1A1MAPT
SCHEMBL24943720 0.87 KMT2A (0.50) KMT2APKMALDH1A1LMNAMAPT
SCHEMBL24943724 0.87 CYP3A4 (0.46) KMT2AALDH1A1KDM4EMAPTHTT
SCHEMBL26413496 0.86 TSHR (0.44) KMT2AALDH1A1KDM4ELMNAMAPT
SCHEMBL26478780 0.86 POLB (0.42) KMT2ASIGMAR1OPRM1ALDH1A1KDM4E
SCHEMBL26413500 0.86 AVPR2 (0.39) KMT2ASIGMAR1OPRM1ALDH1A1MAPT
SCHEMBL24944652 0.85 SIGMAR1 (0.42) KMT2ASIGMAR1OPRM1ALDH1A1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR KMT2A 1033/4885SIGMAR1 327/4885OPRM1 775/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.