Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.42 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.41 |
| ▸ | KCNA3 | P22001 | 2/20 | 0.40 |
| ▸ | MEN1 | O00255 | 3/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.40 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26413478 | 0.90 | SIGMAR1 (0.46) | SIGMAR1OPRM1KCNA3MEN1KMT2A | |
| SCHEMBL24944277 | 0.88 | KDM4E (0.42) | OPRM1ALDH1A1 | |
| SCHEMBL24944092 | 0.88 | KMT2A (0.49) | SIGMAR1OPRM1MEN1KMT2AALDH1A1 | |
| SCHEMBL24944222 | 0.88 | SIGMAR1 (0.42) | SIGMAR1OPRM1KCNA3MEN1KMT2A | |
| SCHEMBL24944859 | 0.86 | OPRM1 (0.44) | OPRM1MEN1KMT2A | |
| SCHEMBL24944281 | 0.85 | KMT2A (0.43) | SIGMAR1OPRM1MEN1KMT2AALDH1A1 | |
| SCHEMBL24944862 | 0.85 | SIGMAR1 (0.46) | SIGMAR1OPRM1MEN1KMT2AALDH1A1 | |
| SCHEMBL26478756 | 0.84 | OPRM1 (0.45) | OPRM1 | |
| SCHEMBL26413498 | 0.84 | OPRM1 (0.42) | OPRM1MEN1KMT2A | |
| SCHEMBL26413558 | 0.84 | SMN1; SMN2 (0.41) | SIGMAR1OPRM1KCNA3MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11644753-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-09 | — | — | US | disclosed |
| US-11644753-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-09 | — | — | US | disclosed |
| US-20230131303-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20230131303-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20230021453-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-01-26 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11644753-B2 | Resist composition and patterning process | HNRNPU, NSUN2, HNRNPR | SIGMAR1 327/4885OPRM1 775/4885KCNA3 1917/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.