SCHEMBL24944307

SCHEMBL24944307

C/C(=C\c1ccccc1)C(=O)OC1(c2ccccc2)CCNCC1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AKR1C3 P42330 1/20 0.44
OPRM1 P35372 4/20 0.42
HTT P42858 1/20 0.38
KMT2A Q03164 4/20 0.36
MEN1 O00255 3/20 0.36
PKM P14618 1/20 0.36
MAPK1 P28482 1/20 0.36
F2 P00734 1/20 0.35
GAA P10253 1/20 0.35
OPRL1 P41146 1/20 0.35
ALDH1A1 P00352 2/20 0.35
NPC1 O15118 2/20 0.35
RAB9A P51151 2/20 0.35
SMN1; SMN2 Q16637 2/20 0.35
DHODH Q02127 1/20 0.35
TRPM8 Q7Z2W7 1/20 0.35
TSHR P16473 1/20 0.34
GLA P06280 1/20 0.34
TDP1 Q9NUW8 1/20 0.34
MAPT P10636 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26422989 0.93 PTGDR2 (0.39) AKR1C3OPRM1HTTKMT2AMEN1
SCHEMBL26413338 0.88 OPRM1 (0.45) OPRM1OPRL1OPRD1OPRK1
SCHEMBL24944239 0.84 OPRM1 (0.49) OPRM1OPRL1OPRD1OPRK1
SCHEMBL24944046 0.84 KMT2A (0.43) AKR1C3OPRM1KMT2AMEN1OPRL1
SCHEMBL24944897 0.83 AKR1C1 (0.45) AKR1C3OPRM1HTTKMT2AMEN1
SCHEMBL24944013 0.83 OPRM1 (0.47) OPRM1OPRD1OPRK1
SCHEMBL24944706 0.81 CYP1A2 (0.39) OPRM1KMT2AMEN1GAAALDH1A1
SCHEMBL24944060 0.81 MCL1 (0.46) OPRM1KMT2AMEN1PKMALDH1A1
SCHEMBL24944261 0.81 OPRM1 (0.46) OPRM1OPRL1OPRD1OPRK1
SCHEMBL11602249 0.80 OPRM1 (0.50) OPRM1GAAOPRL1OPRD1OPRK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR AKR1C3 3695/4885OPRM1 775/4885HTT 594/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.