SCHEMBL24944706

SCHEMBL24944706

COc1cc(OC)c(OC)cc1/C=C(\C)C(=O)OC1(c2ccccc2)CCNCC1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 1/20 0.39
CYP3A4 P08684 1/20 0.39
GAA P10253 1/20 0.39
CYP2D6 P10635 1/20 0.39
SIGMAR1 Q99720 1/20 0.36
OPRM1 P35372 1/20 0.36
MEN1 O00255 5/20 0.34
KMT2A Q03164 5/20 0.34
MAPT P10636 4/20 0.34
TDP1 Q9NUW8 1/20 0.34
NFE2L2 Q16236 1/20 0.34
ABCG2 Q9UNQ0 1/20 0.34
ALDH1A1 P00352 2/20 0.34
SIRT1 Q96EB6 1/20 0.34
NPSR1 Q6W5P4 1/20 0.34
HSD17B10 Q99714 1/20 0.34
KDM4E B2RXH2 2/20 0.33
LMNA P02545 1/20 0.33
TACR1 P25103 1/20 0.33
ITGA4 P13612 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944307 0.81 AKR1C3 (0.44) GAAOPRM1MEN1KMT2AMAPT
SCHEMBL26413338 0.80 OPRM1 (0.45) SIGMAR1OPRM1TACR1
SCHEMBL26425372 0.78 NFE2L2 (0.37) CYP1A2CYP3A4GAACYP2D6SIGMAR1
SCHEMBL26422989 0.77 PTGDR2 (0.39) CYP1A2CYP3A4OPRM1MEN1KMT2A
SCHEMBL24944281 0.77 KMT2A (0.43) CYP3A4SIGMAR1OPRM1MEN1KMT2A
SCHEMBL24944239 0.77 OPRM1 (0.49) SIGMAR1OPRM1TACR1
SCHEMBL24944013 0.76 OPRM1 (0.47) OPRM1NPSR1TACR1KCNH2
SCHEMBL26478949 0.74 LCK (0.46) CYP1A2CYP2D6SIGMAR1OPRM1MEN1
SCHEMBL24944094 0.74 NPC1 (0.47) CYP1A2CYP3A4GAAMEN1KMT2A
SCHEMBL26478785 0.73 OPRM1 (0.40) CYP1A2CYP2D6SIGMAR1OPRM1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR CYP1A2 4868/4885CYP3A4 4746/4885GAA 4531/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.