SCHEMBL26422989

SCHEMBL26422989

C/C(=C\c1ccc(Cl)cc1)C(=O)OC1(c2ccccc2)CCNCC1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTGDR2 Q9Y5Y4 1/20 0.39
OPRM1 P35372 2/20 0.39
NPC1 O15118 2/20 0.39
RAB9A P51151 2/20 0.39
DRD2 P14416 1/20 0.38
CYP2C9 P11712 2/20 0.37
AKR1C3 P42330 1/20 0.37
TRPA1 O75762 1/20 0.37
MAOB P27338 1/20 0.35
HDAC3 O15379 1/20 0.34
HDAC4 P56524 1/20 0.34
HDAC1 Q13547 1/20 0.34
HDAC7 Q8WUI4 1/20 0.34
HDAC2 Q92769 1/20 0.34
HDAC10 Q969S8 1/20 0.34
HDAC11 Q96DB2 1/20 0.34
HDAC8 Q9BY41 1/20 0.34
HDAC6 Q9UBN7 1/20 0.34
HDAC9 Q9UKV0 1/20 0.34
HDAC5 Q9UQL6 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944307 0.93 AKR1C3 (0.44) OPRM1NPC1RAB9AAKR1C3MEN1
SCHEMBL26413338 0.83 OPRM1 (0.45) OPRM1HDAC1TACR1
SCHEMBL24944241 0.81 MAOB (0.46) DRD2TRPA1MAOBMEN1LMNA
SCHEMBL24944239 0.80 OPRM1 (0.49) OPRM1HDAC1TACR1
SCHEMBL24944013 0.79 OPRM1 (0.47) OPRM1TACR1NPSR1
SCHEMBL24944046 0.78 KMT2A (0.43) OPRM1AKR1C3HDAC1MEN1ALDH1A1
SCHEMBL24944259 0.77 NOS2 (0.40) PTGDR2OPRM1DRD2MAOBMEN1
SCHEMBL24944706 0.77 CYP1A2 (0.39) OPRM1TACR1MEN1ALDH1A1LMNA
SCHEMBL24944620 0.77 DRD2 (0.43) PTGDR2OPRM1DRD2HDAC1TACR1
SCHEMBL24944261 0.77 OPRM1 (0.46) OPRM1HDAC1TACR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR PTGDR2 2954/4885OPRM1 775/4885NPC1 4818/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.