SCHEMBL24944476

SCHEMBL24944476

COc1cc(CC(=O)OC2(c3ccccc3)CCNCC2)cc(OC)c1O

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALOX5 P09917 6/20 0.51
OPRM1 P35372 3/20 0.40
GAA P10253 2/20 0.40
MAPT P10636 2/20 0.40
KDM4E B2RXH2 1/20 0.40
TACR1 P25103 1/20 0.38
SIGMAR1 Q99720 1/20 0.38
ABCB1 P08183 1/20 0.37
HPGD P15428 1/20 0.37
POLB P06746 1/20 0.37
CHRM5 P08912 1/20 0.37
CHRM1 P11229 1/20 0.37
CHRM3 P20309 1/20 0.37
TP53 P04637 1/20 0.37
MDM2 Q00987 1/20 0.37
OPRD1 P41143 2/20 0.37
OPRK1 P41145 2/20 0.37
CYP1A2 P05177 1/20 0.37
CYP3A4 P08684 1/20 0.37
CYP2C19 P33261 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944707 0.91 SMN1; SMN2 (0.44) ALOX5OPRM1KDM4ETACR1SIGMAR1
SCHEMBL24944048 0.89 GAA (0.51) ALOX5GAACYP1A2CYP3A4CYP2C19
SCHEMBL24943732 0.87 GAA (0.51) OPRM1GAAMAPTKDM4EHPGD
SCHEMBL24944477 0.86 TACR1 (0.53) OPRM1TACR1SIGMAR1OPRD1OPRK1
SCHEMBL24944266 0.84 OPRM1 (0.43) OPRM1TACR1OPRD1OPRK1
SCHEMBL24944922 0.84 NPC1 (0.48) HPGDCYP1A2CYP3A4CYP2C19
SCHEMBL26478951 0.84 ALDH1A1 (0.44) OPRM1GAAMAPTKDM4EHPGD
SCHEMBL24944263 0.84 ALDH1A1 (0.44) OPRM1GAASIGMAR1POLBCYP1A2
SCHEMBL24944885 0.83 OPRM1 (0.46) OPRM1TACR1OPRD1OPRK1
SCHEMBL24943734 0.82 ALDH1A1 (0.46) OPRM1MAPTTACR1CHRM5CHRM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR ALOX5 2213/4885OPRM1 775/4885GAA 4531/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.