SCHEMBL24944263

SCHEMBL24944263

COc1ccc(CC(=O)OC2(c3ccccc3)CCNCC2)cc1Cl

nearest known ligand 0.46

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.44
SMN1; SMN2 Q16637 1/20 0.44
GAA P10253 1/20 0.40
CYP1A2 P05177 1/20 0.39
CYP3A4 P08684 1/20 0.39
CYP2C19 P33261 1/20 0.39
POLB P06746 2/20 0.39
KMT2A Q03164 2/20 0.39
MEN1 O00255 1/20 0.39
KDM1A O60341 1/20 0.38
MAOA P21397 1/20 0.38
MAOB P27338 1/20 0.38
OPRM1 P35372 1/20 0.38
FOXO1 Q12778 1/20 0.37
SLK Q9H2G2 1/20 0.37
SIGMAR1 Q99720 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24943732 0.88 GAA (0.51) ALDH1A1GAACYP1A2CYP3A4CYP2C19
SCHEMBL24944096 0.88 ALDH1A1 (0.42) ALDH1A1CYP1A2SIGMAR1
SCHEMBL26478951 0.87 ALDH1A1 (0.44) ALDH1A1GAACYP1A2CYP3A4CYP2C19
SCHEMBL24944048 0.86 GAA (0.51) ALDH1A1GAACYP1A2CYP3A4CYP2C19
SCHEMBL24944632 0.86 CA2 (0.47) KMT2AOPRM1SIGMAR1
SCHEMBL24944922 0.85 NPC1 (0.48) SMN1; SMN2CYP1A2CYP3A4CYP2C19KMT2A
SCHEMBL24944707 0.84 SMN1; SMN2 (0.44) ALDH1A1SMN1; SMN2CYP1A2CYP2C19KMT2A
SCHEMBL24944476 0.84 ALOX5 (0.51) GAACYP1A2CYP3A4CYP2C19POLB
SCHEMBL24943734 0.82 ALDH1A1 (0.46) ALDH1A1SMN1; SMN2OPRM1
SCHEMBL26413489 0.82 PTGDR2 (0.43) KMT2AMEN1OPRM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR ALDH1A1 4767/4885SMN1; SMN2 1285/4885GAA 4531/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.