SCHEMBL24944707

SCHEMBL24944707

COc1cc(CC(=O)OC2(c3ccccc3)CCNCC2)cc(OC)c1OC

nearest known ligand 0.44

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 4/20 0.44
LMNA P02545 2/20 0.44
RAB9A P51151 1/20 0.44
L3MBTL1 Q9Y468 2/20 0.43
SIGMAR1 Q99720 1/20 0.41
KMT2A Q03164 1/20 0.41
ALOX5 P09917 1/20 0.40
KDM4E B2RXH2 2/20 0.40
ALDH1A1 P00352 1/20 0.40
OPRM1 P35372 1/20 0.40
CYP1A2 P05177 1/20 0.40
CYP2C9 P11712 1/20 0.40
MAPK1 P28482 1/20 0.40
CYP2C19 P33261 1/20 0.40
TACR1 P25103 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944476 0.91 ALOX5 (0.51) SIGMAR1ALOX5KDM4EOPRM1CYP1A2
SCHEMBL24944266 0.89 OPRM1 (0.43) SMN1; SMN2RAB9AL3MBTL1OPRM1TACR1
SCHEMBL26413844 0.87 HPGD (0.41) LMNAL3MBTL1KMT2A
SCHEMBL24944048 0.87 GAA (0.51) ALOX5ALDH1A1CYP1A2CYP2C19
SCHEMBL24944477 0.86 TACR1 (0.53) SMN1; SMN2L3MBTL1SIGMAR1KMT2AALDH1A1
SCHEMBL24943732 0.84 GAA (0.51) LMNARAB9AKMT2AKDM4EALDH1A1
SCHEMBL24944263 0.84 ALDH1A1 (0.44) SMN1; SMN2SIGMAR1KMT2AALDH1A1OPRM1
SCHEMBL26478951 0.84 ALDH1A1 (0.44) LMNAL3MBTL1KMT2AKDM4EALDH1A1
SCHEMBL24944885 0.83 OPRM1 (0.46) SMN1; SMN2L3MBTL1ALDH1A1OPRM1MAPK1
SCHEMBL24943734 0.82 ALDH1A1 (0.46) SMN1; SMN2L3MBTL1ALDH1A1OPRM1TACR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR SMN1; SMN2 1285/4885LMNA 2930/4885RAB9A 3924/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.