SCHEMBL24944847

SCHEMBL24944847

O=C(COc1ccc(Cl)cc1)OC1(c2ccccc2)CCNCC1

nearest known ligand 0.44

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.44
MEN1 O00255 1/20 0.44
GPR183 P32249 1/20 0.44
ATF4 P18848 3/20 0.44
L3MBTL1 Q9Y468 1/20 0.43
TP53 P04637 1/20 0.41
MAPT P10636 1/20 0.41
PTGS2 P35354 1/20 0.40
POLB P06746 1/20 0.40
PTGDR2 Q9Y5Y4 1/20 0.40
SMN1; SMN2 Q16637 2/20 0.40
OPRM1 P35372 1/20 0.40
CYP1A2 P05177 1/20 0.40
CYP3A4 P08684 1/20 0.40
CYP2C19 P33261 1/20 0.40
ALDH1A1 P00352 1/20 0.39
PKM P14618 1/20 0.39
BLM P54132 1/20 0.39
PMP22 Q01453 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944608 0.91 OPRM1 (0.44) KMT2AMEN1L3MBTL1OPRM1ALDH1A1
SCHEMBL24944653 0.88 OPRM1 (0.45) KMT2AMEN1L3MBTL1MAPTSMN1; SMN2
SCHEMBL26478741 0.88 GPR183 (0.44) KMT2AMEN1GPR183L3MBTL1MAPT
SCHEMBL24944278 0.86 MAPT (0.47) KMT2AL3MBTL1MAPTPOLBSMN1; SMN2
SCHEMBL24944712 0.84 PTPN7 (0.51) KMT2AMEN1GPR183MAPTPOLB
SCHEMBL26413607 0.84 ALDH1A1 (0.47) KMT2AMAPTPTGS2SMN1; SMN2CYP2C19
SCHEMBL24943648 0.84 TDP1 (0.50) L3MBTL1TP53MAPTPOLBSMN1; SMN2
SCHEMBL24944856 0.83 TACR1 (0.40) KMT2AOPRM1
SCHEMBL24944846 0.83 MEN1 (0.43) KMT2AMEN1L3MBTL1TP53MAPT
SCHEMBL26413489 0.82 PTGDR2 (0.43) KMT2AMEN1GPR183L3MBTL1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR KMT2A 1033/4885MEN1 3578/4885GPR183 4420/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.