SCHEMBL24943754

SCHEMBL24943754

O=C(OC1(c2ccccc2)CCNCC1)c1ccc(-c2ccccc2)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 3/20 0.43
PDCD1 Q15116 1/20 0.42
CD274 Q9NZQ7 1/20 0.42
OPRM1 P35372 2/20 0.42
AKT2 P31751 1/20 0.41
OPRD1 P41143 2/20 0.40
OPRK1 P41145 1/20 0.40
KCNH2 Q12809 1/20 0.40
KDM4E B2RXH2 1/20 0.40
HDAC1 Q13547 1/20 0.40
USP2 O75604 1/20 0.39
ALDH1A1 P00352 1/20 0.39
TP53 P04637 1/20 0.39
CYP1A2 P05177 1/20 0.39
CYP3A4 P08684 1/20 0.39
CYP2D6 P10635 1/20 0.39
HPGD P15428 1/20 0.39
TSHR P16473 1/20 0.39
MAPK1 P28482 1/20 0.39
HSD17B10 Q99714 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944875 0.95 AKT2 (0.40) SMN1; SMN2PDCD1CD274OPRM1AKT2
SCHEMBL24943664 0.91 OPRM1 (0.46) OPRM1HDAC1USP2ALDH1A1TSHR
SCHEMBL24943766 0.89 MAPT (0.43) SMN1; SMN2PDCD1CD274OPRM1OPRD1
SCHEMBL26413775 0.89 ALDH1A1 (0.46) OPRM1OPRD1HDAC1USP2ALDH1A1
SCHEMBL24944313 0.89 ESR1 (0.42) OPRM1OPRD1HDAC1ALDH1A1TSHR
SCHEMBL24943715 0.88 KMO (0.43) OPRM1USP2ALDH1A1TP53CYP1A2
SCHEMBL24943674 0.87 NPC1 (0.43) OPRM1OPRD1OPRK1KCNH2HDAC1
SCHEMBL24944620 0.87 DRD2 (0.43) OPRM1KDM4EHDAC1TSHRMAPT
SCHEMBL24944860 0.87 OPRM1 (0.47) SMN1; SMN2OPRM1OPRD1OPRK1KCNH2
SCHEMBL24944081 0.87 OPRM1 (0.44) SMN1; SMN2OPRM1OPRD1OPRK1KCNH2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR SMN1; SMN2 1285/4885PDCD1 2290/4885CD274 2614/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.