SCHEMBL24944657

SCHEMBL24944657

COc1ccc(C(=O)OC2(c3ccccc3)CCNCC2)cc1C

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 1/20 0.41
TAS1R3 Q7RTX0 5/20 0.40
TAS1R1 Q7RTX1 5/20 0.40
SIGMAR1 Q99720 1/20 0.39
ADORA3 P0DMS8 1/20 0.38
ALOX15 P16050 1/20 0.38
NPC1 O15118 2/20 0.38
RAB9A P51151 2/20 0.38
SMN1; SMN2 Q16637 1/20 0.36
MEN1 O00255 1/20 0.36
KMT2A Q03164 1/20 0.36
TNFRSF1A P19438 1/20 0.36
CYP2C19 P33261 2/20 0.35
CYP3A4 P08684 1/20 0.35
CYP2C9 P11712 1/20 0.35
TAS2R14 Q9NYV8 1/20 0.35
CYP1A2 P05177 1/20 0.35
CYP2D6 P10635 1/20 0.35
HPGD P15428 1/20 0.35
TTR P02766 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944679 0.91 OPRM1 (0.41) OPRM1TAS1R3TAS1R1SIGMAR1NPC1
SCHEMBL24944094 0.91 NPC1 (0.47) NPC1RAB9AMEN1KMT2ATNFRSF1A
SCHEMBL24943690 0.87 KMT2A (0.43) OPRM1TAS1R3TAS1R1SIGMAR1ALOX15
SCHEMBL26478761 0.87 CYP1A2 (0.51) OPRM1SIGMAR1RAB9ASMN1; SMN2MEN1
SCHEMBL26413647 0.86 HTT (0.48) RAB9ASMN1; SMN2MEN1KMT2ACYP1A2
SCHEMBL24944087 0.85 SIGMAR1 (0.38) OPRM1SIGMAR1NPC1RAB9AMEN1
SCHEMBL26413512 0.85 OPRM1 (0.41) OPRM1TAS1R3TAS1R1NPC1CYP2D6
SCHEMBL26478754 0.85 OPRM1 (0.44) OPRM1NPC1RAB9A
SCHEMBL26413561 0.84 GAA (0.52) NPC1RAB9ASMN1; SMN2MEN1KMT2A
SCHEMBL24944693 0.83 L3MBTL1 (0.48) OPRM1SIGMAR1ADORA3SMN1; SMN2MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR OPRM1 775/4885TAS1R3 1582/4885TAS1R1 2189/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.