SCHEMBL24944679

SCHEMBL24944679

COc1cc(C(=O)OC2(c3ccccc3)CCNCC2)ccc1C

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 1/20 0.41
SIGMAR1 Q99720 1/20 0.39
PPARG P37231 1/20 0.39
PPARA Q07869 1/20 0.39
NPC1 O15118 2/20 0.38
RAB9A P51151 2/20 0.38
NOTUM Q6P988 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.37
TAS1R3 Q7RTX0 1/20 0.37
TAS1R1 Q7RTX1 1/20 0.37
HSD11B1 P28845 3/20 0.36
ROCK2 O75116 1/20 0.36
ROCK1 Q13464 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
MEN1 O00255 1/20 0.36
KMT2A Q03164 1/20 0.36
TNFRSF1A P19438 1/20 0.36
CYP3A4 P08684 1/20 0.35
CYP2C9 P11712 1/20 0.35
CYP2C19 P33261 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944657 0.91 OPRM1 (0.41) OPRM1SIGMAR1NPC1RAB9ATAS1R3
SCHEMBL24944094 0.91 NPC1 (0.47) NPC1RAB9AL3MBTL1MEN1KMT2A
SCHEMBL26413647 0.88 HTT (0.48) RAB9ASMN1; SMN2MEN1KMT2AHSD17B2
SCHEMBL24944087 0.87 SIGMAR1 (0.38) OPRM1SIGMAR1NPC1RAB9AL3MBTL1
SCHEMBL24944693 0.86 L3MBTL1 (0.48) OPRM1SIGMAR1L3MBTL1SMN1; SMN2MEN1
SCHEMBL26478761 0.85 CYP1A2 (0.51) OPRM1SIGMAR1RAB9AL3MBTL1SMN1; SMN2
SCHEMBL24943690 0.85 KMT2A (0.43) OPRM1SIGMAR1NPC1RAB9ATAS1R3
SCHEMBL24943688 0.85 CYP2D6 (0.45) OPRM1NPC1RAB9ASMN1; SMN2MEN1
SCHEMBL26478748 0.85 OPRM1 (0.44) OPRM1NPC1RAB9ASMN1; SMN2MEN1
SCHEMBL26478947 0.85 SIGMAR1 (0.39) OPRM1SIGMAR1L3MBTL1ROCK2ROCK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR OPRM1 775/4885SIGMAR1 327/4885PPARG 4197/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.