SCHEMBL24944698

SCHEMBL24944698

O=C(OC1(c2ccccc2)CCNCC1)c1c(O)ccc2ccccc12

nearest known ligand 0.48

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ABCG2 Q9UNQ0 6/20 0.43
OPRM1 P35372 2/20 0.37
KDM4E B2RXH2 2/20 0.36
ALDH1A1 P00352 2/20 0.36
GLA P06280 1/20 0.36
GAA P10253 1/20 0.36
HPGD P15428 1/20 0.36
HSD17B10 Q99714 1/20 0.36
PRKCB P05771 1/20 0.35
PRKCA P17252 1/20 0.35
PRKCE Q02156 1/20 0.35
PTPN22 Q9Y2R2 1/20 0.33
MEN1 O00255 1/20 0.33
KMT2A Q03164 1/20 0.33
MRE11 P49959 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24943765 0.86 KDM4E (0.44) OPRM1KDM4EALDH1A1GLAHPGD
SCHEMBL26413463 0.86 OPRM1 (0.43) OPRM1
SCHEMBL24944289 0.85 NCEH1 (0.42) ABCG2OPRM1KDM4EALDH1A1HPGD
SCHEMBL24944934 0.83 LDHA (0.48) ABCG2OPRM1KDM4EMEN1KMT2A
SCHEMBL26413460 0.82 OPRM1 (0.40) OPRM1GAAMEN1KMT2A
SCHEMBL26413797 0.82 AVPR1A (0.48) OPRM1ALDH1A1HSD17B10MRE11
SCHEMBL24944294 0.81 NR4A1 (0.44) OPRM1KDM4EALDH1A1GAAHPGD
SCHEMBL24944097 0.80 OPRM1 (0.44) OPRM1
SCHEMBL26479242 0.80 OPRM1 (0.36) OPRM1ALDH1A1HPGD
SCHEMBL24944936 0.78 SMN1; SMN2 (0.40) OPRM1KDM4EALDH1A1GAAHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR ABCG2 4403/4885OPRM1 775/4885KDM4E 1069/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.